A new fabrication process for uniform SU-8 thick photoresist structures by simultaneously removing edge bead and air bubbles

Journal of Micromechanics and Microengineering

Volumn 21, Issue 12, 2011, Pages

  Lee, Hun ^a   Lee, Kangsun ^a   Ahn, Byungwook ^a   Xu, Jing ^a   Xu, Linfeng ^a   Oh, Kwang W ^a  

^a State University of New York   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AIR BUBBLES; AIR-GAPS; DIFFRACTION EFFECTS; EDGE BEAD; FABRICATION PROCESS; PHOTORESIST SURFACES; SIMPLE METHOD; SLIDE GLASS; SPECIALIZED EQUIPMENT; SUBSTRATE GEOMETRY; THICK PHOTORESISTS; THICKNESS VARIATION; UV EXPOSURE;

PHOTORESISTS;

AIR;

EID: 84855428524     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/12/125006     Document Type: Article

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