Study of optimization condition for spin coating of the photoresist film on rectangular substrate by Taguchi design of an experiment

Songklanakarin Journal of Science and Technology

Volumn 31, Issue 3, 2009, Pages 331-335

  Atthi, Nithi ^a   Nimittrakoolchai, On Uma ^b   Jeamsaksiri, Wutthinan ^a   Supothina, Sitthisuntorn ^b   Hruanun, Charndet ^a   Poyai, Amporn ^a  

^a NATIONAL ELECTRONICS AND COMPUTER TECHNOLOGY CENTER   (Thailand)

^b NATIONAL METAL AND MATERIALS TECHNOLOGY CENTER   (Thailand)

Author keywords

Photoresist; Spin coating; Taguchi DOE method

Indexed keywords

EID: 71549122904     PISSN: 01253395     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. Hui, A. Blosiu, J.O. and Wiberg, D.V. 1998. Taguchi Method Applied in Optimization of Shipley SJR5740 Positive Resist Deposition. Proceedings of SPIE, 3333, pp. 1304-1313.
2. Kuo, Y.K. and Chao, C. 2006. Control ability of spin coating planarization of resist film and optimal control of developers. Microelectronics Journal. 37, 759-764.
3. Luurtsema, G.A. 1997. Spin Coating for Rectangular Sub-strates. University of California, Berkeley.
4. th ed, John Wiley&Sons Inc., New Jersey, USA., pp 622-641.
5. Pham, P. and Boellaard, E. 2004. Photoresist coating methods for the integration of Novel 3-D RF microstructures. Institute of Electrical and Electronics Engineers. 13,3, 491-499.
6. Yang, Y.K. and Chang, T.C. 2006. Experimental analysis and optimization of a photo resist coating process for photolithography in wafer fabrication. Microelectronics Journal 37, 746-751.