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Volumn 11, Issue 7, 2005, Pages 519-525

Reduction of diffraction effect for fabrication of very high aspect ratio microchannels in SU-8 over large area by soft cushion technology

Author keywords

Dense grating; Diffraction; Edge bead; High aspect ratio; SU 8

Indexed keywords

ION BEAM LITHOGRAPHY; MICROSTRUCTURE; OPTICAL FIBER FABRICATION; ORGANIC SOLVENTS; PHOTORESISTORS; REFRACTIVE INDEX; SILICON WAFERS; SPIN COATING; ULTRAVIOLET RADIATION;

EID: 23844531665     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-005-0586-5     Document Type: Review
Times cited : (13)

References (10)
  • 3
    • 0036693343 scopus 로고    scopus 로고
    • Reduction of diffraction effect of UV exposure on SU-8 negative thick photoresist by air gap elimination
    • Chuang Y-J, Tseng F-G, Lin W-K (2002) Reduction of diffraction effect of UV exposure on SU-8 negative thick photoresist by air gap elimination. Microsyst Technol 8:308-313
    • (2002) Microsyst Technol , vol.8 , pp. 308-313
    • Chuang, Y.-J.1    Tseng, F.-G.2    Lin, W.-K.3
  • 5
    • 0031677948 scopus 로고    scopus 로고
    • Taguchi optimization for the processing of EPON SU-8 resist
    • Heidelberg, Germany
    • Eyre B, Blosiu J, Wiberg D (1998) Taguchi optimization for the processing of EPON SU-8 resist. In: Proceedings of MEMS'98 (IEEE). Heidelberg, Germany, pp 218-222
    • (1998) Proceedings of MEMS'98 (IEEE) , pp. 218-222
    • Eyre, B.1    Blosiu, J.2    Wiberg, D.3
  • 6
    • 60849105381 scopus 로고    scopus 로고
    • The optimization and characterization of ultra-thick photoresist films
    • #33338-67
    • Flack WW, Fan WP, White S (1998) The optimization and characterization of ultra-thick photoresist films. SPIE Microlithography, #33338-67
    • (1998) SPIE Microlithography
    • Flack, W.W.1    Fan, W.P.2    White, S.3
  • 7
    • 0041905211 scopus 로고    scopus 로고
    • Equations of exposure time and X-ray mask absorber thickness in the LIGA process
    • Gil KH, Lee SS, Youm Y (2001) Equations of exposure time and X-ray mask absorber thickness in the LIGA process. Microsyst Technol 7:1-5
    • (2001) Microsyst Technol , vol.7 , pp. 1-5
    • Gil, K.H.1    Lee, S.S.2    Youm, Y.3
  • 10
    • 0036734816 scopus 로고    scopus 로고
    • A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresist
    • Lin C-H, Lee G-B, Chang B-W, Chang G-L (2002) A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresist. J Micromech Microeng 12:590-597
    • (2002) J Micromech Microeng , vol.12 , pp. 590-597
    • Lin, C.-H.1    Lee, G.-B.2    Chang, B.-W.3    Chang, G.-L.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.