Simulation of deep UV lithography with SU-8 resist by using 365 nm light source

Microsystem Technologies

Volumn 11, Issue 4-5, 2005, Pages 265-270

  Tian, X ^a   Liu, G ^a   Tian, Y ^a   Zhang, P ^a   Zhang, X ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COMPUTER SIMULATION; ELECTROMAGNETIC WAVE DIFFRACTION; ERRORS; INTEGRAL EQUATIONS; LIGHT SOURCES; MASKS; MATHEMATICAL MODELS; MICROSTRUCTURE; PHOTORESISTS; ULTRAVIOLET RADIATION; VECTORS;

DIFFRACTION MODELS; FILM THICKNESS; FRESNEL DIFFRACTION THEORY; LIGA TECHNOLOGY;

PHOTOLITHOGRAPHY;

EID: 21044456341     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-004-0405-4     Document Type: Conference Paper

References (7)

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