Solution processable low-voltage organic thin film transistors with high-k relaxor ferroelectric polymer as gate insulator

Advanced Materials

Volumn 24, Issue 1, 2012, Pages 88-93

  Li, Jinhua ^a   Sun, Zhenhua ^a   Yan, Feng ^a  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

high k gate dielectrics; organic thin film transistors; relaxor ferroelectric polymers

Indexed keywords

GATE INSULATOR; HIGH-K GATE DIELECTRICS; LOW-VOLTAGE; N-CHANNEL; OPERATING VOLTAGE; ORGANIC THIN FILM TRANSISTORS; PROCESSABLE; RELATIVE DIELECTRIC CONSTANT; RELAXOR FERROELECTRIC;

CARRIER MOBILITY; CONJUGATED POLYMERS; FERROELECTRICITY; FIELD EFFECT TRANSISTORS; GATE DIELECTRICS; THIN FILM TRANSISTORS; THIN FILMS;

FERROELECTRIC MATERIALS;

FLUORINATED HYDROCARBON; ORGANIC COMPOUND; POLY(VINYLIDENEFLUORIDE TRIFLUOROETHYLENE); POLY(VINYLIDENEFLUORIDE-TRIFLUOROETHYLENE); POLYMER; VINYL DERIVATIVE;

ARTICLE; CHEMISTRY; ELECTRICITY; SEMICONDUCTOR;

ELECTRICITY; HYDROCARBONS, FLUORINATED; ORGANIC CHEMICALS; POLYMERS; TRANSISTORS, ELECTRONIC; VINYL COMPOUNDS;

EID: 84855257569     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201103542     Document Type: Article

References (36)

1. G. Horowitz, Adv. Mater. 1998, 10, 365.
2. P. Lin, X. Luo, I.-M. Hsing, F. Yan, Adv. Mater. 2011, 23, 4035.
3. H. Sirringhaus, Adv. Mater. 2005, 17, 2411.
4. G. D. Wilk, R. M. Wallace, J. M. Anthony, J. Appl. Phys. 2001, 89, 5243.
5. C. D. Dimitrakopoulos, S. Purushothaman, J. Kymissis, A. Callegari, J. M. Shaw, Science 1999, 283, 822.
6. B. N. Pal, B. M. Dhar, K. C. See, H. E. Katz, Nat. Mater. 2009, 8, 898.
7. I. N. Hulea, S. Fratini, H. Xie, C. L. Mulder, N. N. Iossad, G. Rastelli, S. Ciuchi, A. F. Morpurgo, Nat. Mater. 2006, 5, 982.
8. L. A. Majewski, R. Schroeder, M. Grell, Adv. Funct. Mater. 2005, 15, 1017.
9. M. Halik, H. Klauk, U. Zschieschang, G. Schmid, C. Dehm, M. Schütz, S. Maisch, F. Effenberger, M. Brunnbauer, F. Stellacci, Nature 2004, 431, 963.
10. H. Klauk, U. Zschieschang, J. Pflaum, M. Halik, Nature 2006, 445, 745.
11. T. Sekitani, T. Yokota, U. Zschieschang, H. Klauk, S. Bauer, K. Takeuchi, M. Takamiya, T. Sakurai, T. Someya, Science 2009, 326, 1516.
12. L. Wang, M. H. Yoon, G. Lu, Y. Yang, A. Facchetti, T. J. Marks, Nat. Mater. 2006, 5, 893.
13. L. A. Majewski, R. Schroeder, M. Grell, Adv. Mater. 2005, 17, 192.
14. H. G. O. Sandberg, T. G. Backlund, R. Osterbacka, H. Stubb, Adv. Mater. 2004, 16, 1112.
15. M. J. Panzer, C. D. Frisbie, Adv. Mater. 2008, 20, 3177.
16. P. Lin, F. Yan, J. J. Yu, H. L. W. Chan, M. Yang, Adv. Mater 2010, 22, 3655.
17. J. D. Yuan, A. S. Dhoot, E. B. Namdas, N. E. Coates, M. Heeney, I. McCulloch, D. Moses, A. J. Heeger, J. Am. Chem. Soc. 2007, 129, 14367.
18. J. Lee, L. G. Kaake, J. H. Cho, X. Y. Zhu, T. P. Lodge, C. D. Frisbie, J. Phys. Chem. C 2009, 113, 8972.
19. R. P. Ortiz, A. Facchetti, T. J. Marks, Chem. Rev. 2010, 110, 205.
20. X. Peng, G. Horowitz, D. Fichou, F. Garnier, Appl. Phys. Lett. 1990, 57, 2013.
21. L. L. Chua, P. K. H. Ho, H. Sirringhaus, R. H. Friend, Appl. Phys. Lett. 2004, 84, 3400.
22. Q. M. Zhang, V. Bharti, X. Zhao, Science 1998, 280, 2101.
23. T. C. Chung, A. Petchsuk, Macromolecules 2002, 35, 7678.
24. V. Bobnar, A. Levstik, C. Huang, Q. M. Zhang, Phys. Rev. Lett. 2004, 92, 047604.
25. I. McCulloch, M. Heeney, C. Bailey, K. Genevicius, I. MacDonald, M. Shkunov, D. Sparrowe, S. Tierney, R. Wagner, W. Zhang, M. L. Chabinyc, R. J. Kline, M. D. McGehee, M. F. Toney, Nat. Mater. 2006, 5, 328.
26. H. Yan, Z. Chen, Y. Zheng, C. Newman, J. R. Quinn, F. Dötz, M. Kastler, A. Facchetti, Nature 2009, 457, 679.
27. M. L. Chabinyc, R. Lujan, F. Endicott, M. F. Toney, I. McCulloch, M. Heeney, Appl. Phys. Lett. 2007, 90, 233508.
28. A. Salleo, T. W. Chen, A. R. Völkel, Y. Wu, P. Liu, B. S. Ong, R. A. Street, Phys. Rev. B 2004, 70, 115311.
29. H. Sirringhaus, P. J. Brown, R. H. Friend, M. M. Nielsen, K. Bechgaard, B. M. W. Langeveld-Voss, A. J. H. Spiering, R. A. J. Janssen, E. W. Meijer, P. Herwig, D. M. de Leeuw, Nature 1999, 401, 685.
30. Z. H. Sun, J. H. Li, C. M. Liu, S. H. Yang, F. Yan, Adv. Mater. 2011, 23, 3648.
31. J. Veres, S. D. Ogier, S. W. Leeming, D. C. Cupertino, S. M. Khaffaf, Adv. Funct. Mater. 2003, 13, 199.
32. T. Richards, M. Bird, H. Sirringhaus, J. Chem. Phys. 2008, 128, 234905.
33. N. Zhao, Y. Y. Noh, J. F. Chang, M. Heeney, I. McCulloch, H. Sirringhaus, Adv. Mater. 2009, 21, 3759.
34. H. Sirringhaus, M. Bird, T. Richards, N. Zhao, Adv. Mater. 2010, 22, 3893.
35. J. Rivnay, M. F. Toney, Y. Zheng, I. V. Kauvar, Z. Chen, V. Wagner, A. Facchetti, A. Salleo, Adv. Mater. 2010, 22, 4359.
36. A. F. Stassen, W. I. de Boer, N. N. Iosad, A. F. Morpurgo, Appl. Phys. Lett. 2007, 85, 3899.