Improvement in brightness of multicusp-plasma ion source

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2717-2720

  Ji, Q ^a,b   Jiang, X ^a,c   King, T J ^a,b   Leung, K N ^a,c   Standiford, K ^a,d   Wilde, S B ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c Etcheverry Hall MCI 730   (United States)

^d Keith Standiford Consulting Services   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; CURRENT DENSITY; ELECTRIC FIELDS; ION BEAM LITHOGRAPHY; ION SOURCES; MAGNETIC FIELDS; PLASMA DENSITY;

COUNTER-BORED EXTRACTOR; FOCUSED BEAM CURRENT DENSITY; MULTICUSP-PLASMA ION SOURCE; RAY TRACING SIMULATIONS;

PLASMA SOURCES;

EID: 0036883147     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1526694     Document Type: Article

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