Nanoscale machinability and subsurface damage machined by CMP of soft-brittle CdZnTe crystals

International Journal of Advanced Manufacturing Technology

Volumn 47, Issue 9-12, 2010, Pages 1105-1112

  Zhang, Zhenyu ^a   Meng, Yaowu ^a   Guo, Dongming ^a   Kang, Renke ^a   Gao, Hang ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

CdZnTe; Chemical mechanical polishing; Nanoscale machinability; Soft brittle crystal; Subsurface damage

Indexed keywords

AMORPHOUS STATE; CDZNTE; CDZNTE CRYSTALS; CONSTANT LOADS; FRICTION COEFFICIENTS; HARDENING EFFECTS; HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPES; HRTEM IMAGES; MACHINED SURFACE; MATERIAL REMOVAL MODE; MECHANICAL POLISHING; MICROSCRATCHES; NANO SCALE; NANO-SCRATCH; PILE-UPS; SUB-SURFACE DAMAGE; SURFACE MACHINING; WEAR TRACKS;

CADMIUM ALLOYS; CADMIUM COMPOUNDS; FRICTION; NANOTECHNOLOGY; PILES; TRANSMISSION ELECTRON MICROSCOPY; ZINC;

CHEMICAL MECHANICAL POLISHING;

EID: 83755195209     PISSN: 02683768     EISSN: 14333015     Source Type: Journal    
DOI: 10.1007/s00170-009-2225-2     Document Type: Article

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