Grey forecasting run-to-run control system in copper chemical mechanical polishing

International Journal of Advanced Manufacturing Technology

Volumn 41, Issue 1-2, 2009, Pages 48-56

  Wang, Gou Jen ^a   Wang, Ming Tzong ^b   Yang, Feng Cheng ^b   Huang, Min Liang ^c   Loh, Kou Ning ^a   Chen, Jacob ^d  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c ORIENTAL INSTITUTE OF TECHNOLOGY   (Taiwan)

^d CHING YUN UNIVERSITY   (Taiwan)

Author keywords

Copper chemical mechanical polishing (CMP); Forecast; Grey forecasting model (GFM); Recursive least squares (RLS) algorithm; Run to run process control; Semiconductors; Simulations

Indexed keywords

ADAPTIVE FILTERING; ALGORITHMS; CHEMICAL MECHANICAL POLISHING; CHEMICAL POLISHING; COMPUTATIONAL FLUID DYNAMICS; CONTROL SYSTEM ANALYSIS; COPPER; CRYSTALS; ELECTRIC CONDUCTIVITY; FORECASTING; NANOTECHNOLOGY; PARAMETER ESTIMATION; POLISHING; RECURSIVE FUNCTIONS; SEMICONDUCTOR MATERIALS;

COPPER CHEMICAL MECHANICAL POLISHING (CMP); FORECAST; GREY FORECASTING MODEL (GFM); RECURSIVE LEAST-SQUARES (RLS) ALGORITHM; RUN-TO-RUN PROCESS CONTROL; SEMICONDUCTORS; SIMULATIONS;

PROCESS CONTROL;

EID: 60949089197     PISSN: 02683768     EISSN: 14333015     Source Type: Journal    
DOI: 10.1007/s00170-008-1452-2     Document Type: Article

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