Chemical mechanical polishing and nanomechanics of semiconductor CdZnTe single crystals

Semiconductor Science and Technology

Volumn 23, Issue 10, 2008, Pages

  Zhang, Zhenyu ^a   Gao, Hang ^a   Jie, Wanqi ^b   Guo, Dongming ^a   Kang, Renke ^a   Li, Yan ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; ACIDS; CADMIUM ALLOYS; CADMIUM COMPOUNDS; CHEMICAL MECHANICAL POLISHING; CHEMICAL POLISHING; CRYSTALLOGRAPHY; CRYSTALS; ELASTIC MODULI; ELECTRIC CONDUCTIVITY; FRICTION; HARDNESS; NANOINDENTATION; PHOTORESISTS; POWDERS; SEMICONDUCTING CADMIUM COMPOUNDS; SEMICONDUCTING TELLURIUM; SEMICONDUCTOR MATERIALS; SURFACE PROPERTIES; SURFACE ROUGHNESS; SURFACES; ZINC;

ACID SOLUTIONS; CDZN-TE; CHEMICALLY MECHANICALLY POLISHED; INDENTATION LOADS; MODIFIED VERTICAL BRIDGMAN METHODS; NANOINDENTER; NANOSCALE LEVELS; SEMI-CONDUCTORS; SEMICONDUCTOR WAFERS; SMOOTH SURFACES;

SINGLE CRYSTALS;

EID: 56349100190     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/23/10/105023     Document Type: Article

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