-
1
-
-
0001410026
-
-
10.1063/1.103867
-
T. Sakuma, S. Yamamichi, S. Matsubara, H. Yamaguchi, and Y. Miyasaka, Appl. Phys. Lett. 57 (23), 2431 (1990). 10.1063/1.103867
-
(1990)
Appl. Phys. Lett.
, vol.57
, Issue.23
, pp. 2431
-
-
Sakuma, T.1
Yamamichi, S.2
Matsubara, S.3
Yamaguchi, H.4
Miyasaka, Y.5
-
2
-
-
34547829308
-
Increment of dielectric properties of SrTi O3 thin films by SrO interlayer on Ru bottom electrodes
-
DOI 10.1063/1.2768887
-
J. H. Ahn, J. Y. Kim, S. W. Kang, J. H. Kim, and J. S. Roh, Appl. Phys. Lett. 91, 062910 (2007). 10.1063/1.2768887 (Pubitemid 47247162)
-
(2007)
Applied Physics Letters
, vol.91
, Issue.6
, pp. 062910
-
-
Ahn, J.-H.1
Kim, J.-Y.2
Kang, S.-W.3
Kim, J.-H.4
Roh, J.-S.5
-
3
-
-
33646423591
-
-
10.1063/1.2198518
-
A. Laha, E. Bugiel, H. J. Osten, and A. Fissel, Appl. Phys. Lett. 88, 172107 (2006). 10.1063/1.2198518
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 172107
-
-
Laha, A.1
Bugiel, E.2
Osten, H.J.3
Fissel, A.4
-
4
-
-
79551623141
-
-
10.1116/1.3521507
-
A. Krause, W. Weber, A. Jahn, K. Richter, D. Pohl, B. Rellinghaus, U. Schrder, J. Heitmann, and T. Mikolajick, J. Vac. Sci. Technol. B 29, 01AC07 (2011). 10.1116/1.3521507
-
(2011)
J. Vac. Sci. Technol. B
, vol.29
-
-
Krause, A.1
Weber, W.2
Jahn, A.3
Richter, K.4
Pohl, D.5
Rellinghaus, B.6
Schrder, U.7
Heitmann, J.8
Mikolajick, T.9
-
5
-
-
79551620968
-
-
Springer, Berlin
-
M. Adachi, Y. Akishige, T. Asahi, K. Deguchi, K. Gesi, K. Hasebe, T. Hikita, T. Ikeda, Y. Iwata, M. Komukae, Oxides (Springer, Berlin, 2002), Vol. 36A1, pp. 1-18.
-
(2002)
Oxides
, vol.36 A1
, pp. 1-18
-
-
Adachi, M.1
Akishige, Y.2
Asahi, T.3
Deguchi, K.4
Gesi, K.5
Hasebe, K.6
Hikita, T.7
Ikeda, T.8
Iwata, Y.9
Komukae, M.10
-
8
-
-
0000517705
-
-
10.1063/1.119148
-
M. Copel, P. R. Duncombe, D. A. Neumayer, T. M. Shaw, and R. M. Tromp, Appl. Phys. Lett. 70, 3227 (1997). 10.1063/1.119148
-
(1997)
Appl. Phys. Lett.
, vol.70
, pp. 3227
-
-
Copel, M.1
Duncombe, P.R.2
Neumayer, D.A.3
Shaw, T.M.4
Tromp, R.M.5
-
9
-
-
0000558071
-
-
10.1063/1.360553
-
G. W. Dietz, W. Antphler, M. Klee, and R. Waser, J. Appl. Phys. 78, 6113 (1995). 10.1063/1.360553
-
(1995)
J. Appl. Phys.
, vol.78
, pp. 6113
-
-
Dietz, G.W.1
Antphler, W.2
Klee, M.3
Waser, R.4
-
10
-
-
0032634975
-
-
10.1016/S0026-2714(98)00218-2
-
C. Chaneliere, S. Four, J. L. Autran, and R. A. B. Devine, Microelectron. Reliab. 39, 261 (1999). 10.1016/S0026-2714(98)00218-2
-
(1999)
Microelectron. Reliab.
, vol.39
, pp. 261
-
-
Chaneliere, C.1
Four, S.2
Autran, J.L.3
Devine, R.A.B.4
-
11
-
-
0035394783
-
2 thin films during high temperature X-ray diffraction
-
DOI 10.1016/S0026-2714(01)00055-5, PII S0026271401000555
-
C. Zhao, G. Roebben, H. Bender, E. Young, S. Haukka, M. Houssa, M. Naili, S. D. Gendt, M. Heyns, and O. V. D. Biest, Microelectron. Reliab. 41, 995 (2001). 10.1016/S0026-2714(01)00055-5 (Pubitemid 32698327)
-
(2001)
Microelectronics and Reliability
, vol.41
, Issue.7
, pp. 995-998
-
-
Zhao, C.1
Roebben, G.2
Bender, H.3
Young, E.4
Haukka, S.5
Houssa, M.6
Naili, M.7
De Gendt, S.8
Heyns, M.9
Van Der Biest, O.10
-
12
-
-
0037415948
-
-
10.1016/S0040-6090(02)01262-2
-
S. Jakschik, U. Schroeder, T. Hecht, M. Gutsche, H. Seidl, and J. W. Bartha, Thin Solid Films 425, 216 (2003). 10.1016/S0040-6090(02)01262-2
-
(2003)
Thin Solid Films
, vol.425
, pp. 216
-
-
Jakschik, S.1
Schroeder, U.2
Hecht, T.3
Gutsche, M.4
Seidl, H.5
Bartha, J.W.6
-
14
-
-
82955218586
-
-
American Mineralogist Crystal Structure Database (AMCSD), Database Entry 0011157 for Pt, cubic closest packed.
-
American Mineralogist Crystal Structure Database (AMCSD), Database Entry 0011157 for Pt, cubic closest packed.
-
-
-
-
15
-
-
57649089153
-
-
10.1143/APEX.1.061603
-
J. Son, J. Cagnon, D. S. Boesch, and S. Stemmer, Appl. Phys. Express 1, 061603 (2008). 10.1143/APEX.1.061603
-
(2008)
Appl. Phys. Express
, vol.1
, pp. 061603
-
-
Son, J.1
Cagnon, J.2
Boesch, D.S.3
Stemmer, S.4
-
16
-
-
70349913717
-
-
10.1063/1.3243987
-
D. Martin, M. Grube, W. M. Weber, J. Rstig, O. Bierwagen, L. Geelhaar, and H. Riechert, Appl. Phys. Lett. 95, 142906 (2009). 10.1063/1.3243987
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 142906
-
-
Martin, D.1
Grube, M.2
Weber, W.M.3
Rstig, J.4
Bierwagen, O.5
Geelhaar, L.6
Riechert, H.7
-
17
-
-
34250754390
-
y thin films measured by conductive atomic-force microscopy
-
DOI 10.1063/1.2746058
-
O. Bierwagen, L. Geelhaar, X. Gay, M. Piei, H. Riechert, B. Jobst, and A. Rucki, Appl. Phys. Lett. 90, 232901 (2007). 10.1063/1.2746058 (Pubitemid 46960299)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.23
, pp. 232901
-
-
Bierwagen, O.1
Geelhaar, L.2
Gay, X.3
Piesins, M.4
Riechert, H.5
Jobst, B.6
Rucki, A.7
-
18
-
-
42749100924
-
-
10.1103/PhysRevB.69.195309
-
J. Heitmann, F. Mller, L. Yi, M. Zacharias, D. Kovalev, and F. Eichhorn, Phys. Rev. B 69, 195309 (2004). 10.1103/PhysRevB.69.195309
-
(2004)
Phys. Rev. B
, vol.69
, pp. 195309
-
-
Heitmann, J.1
Mller, F.2
Yi, L.3
Zacharias, M.4
Kovalev, D.5
Eichhorn, F.6
-
19
-
-
0345711681
-
3
-
DOI 10.1016/S0304-3991(99)00022-4, PII S0304399199000224
-
H. Gu and M. Ceh, Ultramicroscopy 78, 221 (1999). 10.1016/S0304-3991(99) 00022-4 (Pubitemid 29301972)
-
(1999)
Ultramicroscopy
, vol.78
, Issue.1-4
, pp. 221-231
-
-
Gu, H.1
Ceh, M.2
-
20
-
-
82955206606
-
-
See supplementary material at E-APPLAB-99-094148 for a full description of the preparation, structuring, and characterization of the samples.
-
See supplementary material at http://dx.doi.org/10.1063/1.3664395 E-APPLAB-99-094148 for a full description of the preparation, structuring, and characterization of the samples.
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