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Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 29, Issue 1, 2011, Pages

Evaluation of the electrical and physical properties of thin calcium titanate high-k insulators for capacitor applications

(9) Krause, A a Weber, W a Jahn, A b Richter, K b Pohl, D c Rellinghaus, B c Schroder U a Heitmann, J a,d Mikolajick, T a,b

a NAMLAB GGMBH (Germany)

b DRESDEN UNIVERSITY OF TECHNOLOGY (Germany)

c IFW DRESDEN (Germany)

d Department of Geology (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BEHAVIORAL RESEARCH; CALCIUM COMPOUNDS; CAPACITORS; ELECTRIC PROPERTIES; FIELD EFFECT TRANSISTORS; FILMS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; METAL INSULATOR BOUNDARIES; MICROELECTRONICS; PLATINUM; X RAY DIFFRACTION;

AMORPHOUS MATRICES; AS-GROWN; BOTTOM ELECTRODES; CALCIUM TITANATE; CAPACITANCE-EQUIVALENT THICKNESS; CRYSTALLIZATION BEHAVIOR; CRYSTALLIZED FILMS; DEPOSITION TEMPERATURES; DIELECTRIC CONSTANTS; ELECTRODE MATERIAL; FUNCTION VALUES; GATE STACKS; GRAZING INCIDENCE X-RAY DIFFRACTION; HIGH-K INSULATORS; INSULATOR MATERIALS; K-VALUES; LEAKAGE DENSITY; METAL-INSULATOR-METAL CAPACITORS; MICRO-ELECTRONIC DEVICES;

MIM DEVICES;

EID: 79551623141 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3521507 Document Type: Conference Paper

Times cited : (12)

References (25)

1
- 84905938971
- See.
- See www.itrs.net.

2
- 0034187380
- 1071-1023, 10.1116/1.591472
- J. Robertson, J. Vac. Sci. Technol. B 1071-1023 18, 1785 (2000). 10.1116/1.591472
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 1785
- Robertson, J.¹

3
- 79551646811
- 0003-6951.
- S. W. Lee, O. S. Kwon, J. H. Han, and C. S. Hwang, Appl. Phys. Lett. 0003-6951 92, 22 (2008).
- (2008) Appl. Phys. Lett. , vol.92 , pp. 22
- Lee, S.W.¹ Kwon, O.S.² Han, J.H.³ Hwang, C.S.⁴

4
- 1642475230
- Ferroelectricity at the nanoscale: Local polarization in oxide thin films and heterostructures
- DOI 10.1126/science.1092508
- C. H. Ahn, K. M. Rabe, and J. Triscone, Science 0036-8075 303, 488 (2004). 10.1126/science.1092508 (Pubitemid 38120840)
- (2004) Science , vol.303 , Issue.5657 , pp. 488-491
- Ahn, C.H.¹ Rabe, K.M.² Triscone, J.-M.³

5
- 14644442334
- 3 by sol-gel synthesis and rapid thermal processing
- DOI 10.1016/j.surfcoat.2004.07.044, PII S0257897204005225
- S. Holliday and A. Stanishevsky, Surf. Coat. Technol. 0257-8972 188-189, 741 (2004). 10.1016/j.surfcoat.2004.07.044 (Pubitemid 40318349)
- (2004) Surface and Coatings Technology , vol.188-189 , Issue.1-3 SPEC. ISS. , pp. 741-744
- Holliday, S.¹ Stanishevsky, A.²

6
- 0037416869
- 3 coatings for biocompatible applications
- DOI 10.1016/S0928-4931(02)00319-3
- M. Manso, M. Langlet, and J. M. Martínez-Duart, Mater. Sci. Eng., C 0928-4931 23, 447 (2003). 10.1016/S0928-4931(02)00319-3 (Pubitemid 36211441)
- (2003) Materials Science and Engineering C , vol.23 , Issue.3 , pp. 447-450
- Manso, M.¹ Langlet, M.² Martinez-Duart, J.M.³

7
- 24644516589
- 3 films sputter-deposited under simultaneous Ti-ion implantation on Ti-substrate
- DOI 10.1016/j.surfcoat.2005.02.189, PII S0257897205004172
- K. Asami, N. Ohtsu, K. Saito, and T. Hanawa, Surf. Coat. Technol. 0257-8972 200, 1005 (2005). 10.1016/j.surfcoat.2005.02.189 (Pubitemid 41269053)
- (2005) Surface and Coatings Technology , vol.200 , Issue.1-4 SPEC. ISS. , pp. 1005-1008
- Asami, K.¹ Ohtsu, N.² Saito, K.³ Hanawa, T.⁴

8
- 46749112956
- 0257-8972, 10.1016/j.surfcoat.2008.05.035
- N. Ohtsu, C. Abe, T. Ashino, S. Semboshi, and K. Wagatsuma, Surf. Coat. Technol. 0257-8972 202, 5110 (2008). 10.1016/j.surfcoat.2008.05.035
- (2008) Surf. Coat. Technol. , vol.202 , pp. 5110
- Ohtsu, N.¹ Abe, C.² Ashino, T.³ Semboshi, S.⁴ Wagatsuma, K.⁵

9
- 34249044907
- Characterization of calcium titanate thin films deposited on titanium with reactive sputtering and pulsed laser depositions
- DOI 10.1016/j.surfcoat.2007.02.043, PII S0257897207001788
- N. Ohtsu, A. Ito, K. Saito, and T. Hanawa, Surf. Coat. Technol. 0257-8972 201, 7686 (2007). 10.1016/j.surfcoat.2007.02.043 (Pubitemid 46796639)
- (2007) Surface and Coatings Technology , vol.201 , Issue.18 , pp. 7686-7691
- Ohtsu, N.¹ Ito, A.² Saito, K.³ Hanawa, T.⁴

10
- 0032680627
- 0038-1098, 10.1016/S0038-1098(99)00153-2
- V. V. Lemanov, A. V. Sotnikov, E. P. Smirnova, M. Weihnacht, and R. Kunze, Solid State Commun. 0038-1098 110, 611 (1999). 10.1016/S0038-1098(99) 00153-2
- (1999) Solid State Commun. , vol.110 , pp. 611
- Lemanov, V.V.¹ Sotnikov, A.V.² Smirnova, E.P.³ Weihnacht, M.⁴ Kunze, R.⁵

11
- 79551620968
- Landolt-Börnstein-GrouIII Condensed Matter (Springer, Berlin), Vol.
- M. Adachi, Oxides, Landolt-Börnstein-Group III Condensed Matter (Springer, Berlin, 2002), Vol. 36A1, pp. 1-18.
- (2002) Oxides , vol.361 , pp. 1-18
- Adachi, M.¹

12
- 67650730201
- 0021-8979, 10.1063/1.3157212
- A. Kersch and D. Fischer, J. Appl. Phys. 0021-8979 106, 014105 (2009). 10.1063/1.3157212
- (2009) J. Appl. Phys. , vol.106 , pp. 014105
- Kersch, A.¹ Fischer, D.²

13
- 0000211962
- 0953-8984, 10.1088/0953-8984/10/16/018
- K. Ueda, H. Yanagi, R. Noshiro, H. Hosono, and H. Kawazoe, J. Phys.: Condens. Matter 0953-8984 10, 3669 (1998). 10.1088/0953-8984/10/16/018
- (1998) J. Phys.: Condens. Matter , vol.10 , pp. 3669
- Ueda, K.¹ Yanagi, H.² Noshiro, R.³ Hosono, H.⁴ Kawazoe, H.⁵

14
- 0000331984
- 0953-8984, 10.1088/0953-8984/11/17/311
- K. Ueda, H. Yanagi, H. Hosono, and H. Kawazoe, J. Phys.: Condens. Matter 0953-8984 11, 3535 (1999). 10.1088/0953-8984/11/17/311
- (1999) J. Phys.: Condens. Matter , vol.11 , pp. 3535
- Ueda, K.¹ Yanagi, H.² Hosono, H.³ Kawazoe, H.⁴

15
- 0345603626
- 0021-4922, 10.1143/JJAP.42.6158
- B. D. Lee, K. H. Yoon, E. S. Kim, and T. H. Kim, Jpn. J. Appl. Phys., Part 1 0021-4922 42, 6158 (2003). 10.1143/JJAP.42.6158
- (2003) Jpn. J. Appl. Phys., Part 1 , vol.42 , pp. 6158
- Lee, B.D.¹ Yoon, K.H.² Kim, E.S.³ Kim, T.H.⁴

16
- 50649109819
- 0300-9467, 10.1016/j.cej.2008.05.017
- L. Cavalcante, V. Marques, J. Sczancoski, M. Escote, M. Joya, J. Varela, M. Santos, P. Pizani, and E. Longo, Chem. Eng. J. 0300-9467 143, 299 (2008). 10.1016/j.cej.2008.05.017
- (2008) Chem. Eng. J. , vol.143 , pp. 299
- Cavalcante, L.¹ Marques, V.² Sczancoski, J.³ Escote, M.⁴ Joya, M.⁵ Varela, J.⁶ Santos, M.⁷ Pizani, P.⁸ Longo, E.⁹

17
- 0000830538
- 1600-5368, 10.1107/S0365110X57000675
- H. F. Kay and P. C. Bailey, Acta Crystallogr. 1600-5368 10, 219 (1957). 10.1107/S0365110X57000675
- (1957) Acta Crystallogr. , vol.10 , pp. 219
- Kay, H.F.¹ Bailey, P.C.²

18
- 84944812945
- 0108-7681, 10.1107/S0108768192004592
- R. H. Buttner and E. N. Maslen, Acta Crystallogr., Sect. B: Struct. Sci. 0108-7681 48, 644 (1992). 10.1107/S0108768192004592
- (1992) Acta Crystallogr., Sect. B: Struct. Sci. , vol.48 , pp. 644
- Buttner, R.H.¹ Maslen, E.N.²

19
- 0035394783
- 2 thin films during high temperature X-ray diffraction
- DOI 10.1016/S0026-2714(01)00055-5, PII S0026271401000555
- C. Zhao, Microelectron. Reliab. 0026-2714 41, 995 (2001). 10.1016/S0026-2714(01)00055-5 (Pubitemid 32698327)
- (2001) Microelectronics and Reliability , vol.41 , Issue.7 , pp. 995-998
- Zhao, C.¹ Roebben, G.² Bender, H.³ Young, E.⁴ Haukka, S.⁵ Houssa, M.⁶ Naili, M.⁷ De Gendt, S.⁸ Heyns, M.⁹ Van Der Biest, O.¹⁰

20
- 0037415948
- 0040-6090, 10.1016/S0040-6090(02)01262-2
- S. Jakschik, U. Schroeder, T. Hecht, M. Gutsche, H. Seidl, and J. W. Bartha, Thin Solid Films 0040-6090 425, 216 (2003). 10.1016/S0040-6090(02)01262- 2
- (2003) Thin Solid Films , vol.425 , pp. 216
- Jakschik, S.¹ Schroeder, U.² Hecht, T.³ Gutsche, M.⁴ Seidl, H.⁵ Bartha, J.W.⁶

21
- 31144455203
- Effect of thickness on the crystallization of ultrathin HfSiON gate dielectrics
- DOI 10.1063/1.2165182, 032901
- G. Pant, A. Gnade, M. J. Kim, R. M. Wallace, B. E. Gnade, M. A. Quevedo-Lopez, and P. D. Kirsch, Appl. Phys. Lett. 0003-6951 88, 032901 (2006). 10.1063/1.2165182 (Pubitemid 43133700)
- (2006) Applied Physics Letters , vol.88 , Issue.3 , pp. 1-3
- Pant, G.¹ Gnade, A.² Kim, M.J.³ Wallace, R.M.⁴ Gnade, B.E.⁵ Quevedo-Lopez, M.A.⁶ Kirsch, P.D.⁷

22
- 0034664594
- Crystallization of amorphous superlattices in the limit of ultrathin films with oxide interfaces
- DOI 10.1103/PhysRevB.62.8391
- M. Zacharias and P. Streitenberger, Phys. Rev. B 0556-2805 62, 8391 (2000). 10.1103/PhysRevB.62.8391 (Pubitemid 32366554)
- (2000) Physical Review B - Condensed Matter and Materials Physics , vol.62 , Issue.12 , pp. 8391-8396
- Zacharias, M.¹ Streitenberger, P.²

23
- 34250754390
- y thin films measured by conductive atomic-force microscopy
- DOI 10.1063/1.2746058
- O. Bierwagen, L. Geelhaar, X. Gay, M. Piešišs, H. Riechert, B. Jobst, and A. Rucki, Appl. Phys. Lett. 0003-6951 90, 232901 (2007). 10.1063/1.2746058 (Pubitemid 46960299)
- (2007) Applied Physics Letters , vol.90 , Issue.23 , pp. 232901
- Bierwagen, O.¹ Geelhaar, L.² Gay, X.³ Piesins, M.⁴ Riechert, H.⁵ Jobst, B.⁶ Rucki, A.⁷

24
- 70349913717
- 0003-6951, 10.1063/1.3243987
- D. Martin, M. Grube, W. M. Weber, J. Ruestig, O. Bierwagen, L. Geelhaar, and H. Riechert, Appl. Phys. Lett. 0003-6951 95, 142906 (2009). 10.1063/1.3243987
- (2009) Appl. Phys. Lett. , vol.95 , pp. 142906
- Martin, D.¹ Grube, M.² Weber, W.M.³ Ruestig, J.⁴ Bierwagen, O.⁵ Geelhaar, L.⁶ Riechert, H.⁷

25
- 46049085611
- 0003-6951, 10.1063/1.2953068
- V. Yanev, Appl. Phys. Lett. 0003-6951 92, 252910 (2008). 10.1063/1.2953068
- (2008) Appl. Phys. Lett. , vol.92 , pp. 252910
- Yanev, V.¹

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