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Volumn 82, Issue 11, 2011, Pages

Scanning photoelectron microscope for nanoscale three-dimensional spatial-resolved electron spectroscopy for chemical analysis

Author keywords

[No Author keywords available]

Indexed keywords

ACCEPTANCE ANGLE; ANGULAR DEPENDENCE; BEAM LINES; CHEMICAL STATE ANALYSIS; DEPTH-PROFILE ANALYSIS; ELECTRON SPECTROMETER; ELECTRON SPECTROSCOPY FOR CHEMICAL ANALYSIS; FRESNEL ZONE PLATE; GATE PATTERNS; HIGH RESOLUTION; HIGH-RESOLUTION ANGLE-RESOLVED; MICROSCOPE SYSTEMS; NANO SCALE; NON DESTRUCTIVE; PHOTOELECTRON SPECTRUM; SPATIAL RESOLUTION; SPATIALLY RESOLVED; SPRING-8;

EID: 82555173689     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3657156     Document Type: Article
Times cited : (62)

References (22)
  • 13
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    • 2 on Si. VI. Evaluation of uncertainties in thickness measurement using XPS
    • DOI 10.1002/sia.2020
    • M. P. Seah, Surf. Interface Anal. 37, 300 (2005). 10.1002/sia.2020 (Pubitemid 40325420)
    • (2005) Surface and Interface Analysis , vol.37 , Issue.3 , pp. 300-309
    • Seah, M.P.1
  • 14
    • 34548514420 scopus 로고    scopus 로고
    • Influence of elastic scattering of photoelectrons on angle-resolved x-ray photoelectron spectroscopy
    • DOI 10.1063/1.2772769
    • K. Kimura, K. Nakajima, T. Conard, and W. Vandervorst, Appl. Phys. Lett. 91, 104106 (2007). 10.1063/1.2772769 (Pubitemid 47379095)
    • (2007) Applied Physics Letters , vol.91 , Issue.10 , pp. 104106
    • Kimura, K.1    Nakajima, K.2    Conard, T.3    Vandervorst, W.4
  • 15
    • 82555172937 scopus 로고    scopus 로고
    • NIST Electron Effective Attenuation Length Database, Version 1.0, National Institute of Standards and Technology, Gaithersburg, MD
    • C. J. Powell and A. Jablonski, NIST Electron Effective Attenuation Length Database, Version 1.0, National Institute of Standards and Technology, Gaithersburg, MD, 2001.
    • (2001)
    • Powell, C.J.1    Jablonski, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.