Manipulating InAs nanowires with submicrometer precision

Review of Scientific Instruments

Volumn 82, Issue 11, 2011, Pages

  Flöhr, Kilian ^a   Liebmann, Marcus ^a   Sladek, Kamil ^b   Gnel, H Yusuf ^b   Frielinghaus, Robert ^b   Haas, Fabian ^b   Meyer, Carola ^b   Hardtdegen, Hilde ^b   Schpers, Thomas ^b   Grtzmacher, Detlev ^b   Morgenstern, Markus ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION FORCES; CATALYST-FREE; INAS; METAL-ORGANIC VAPOR PHASE EPITAXY; OPTICAL MICROSCOPES; SUBMICROMETERS;

ADHESION; EPITAXIAL GROWTH; INDIUM ARSENIDE; MICROSCOPES; NANOWIRES; ORGANOMETALLICS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

METALLORGANIC VAPOR PHASE EPITAXY;

EID: 82555173682     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3657135     Document Type: Article

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