메뉴 건너뛰기




Volumn 69, Issue 4, 2010, Pages 207-221

A short review on the pulsed laser deposition of Er3+ ion doped oxide glass thin films for integrated optics

Author keywords

Dry etching; Glass thin film; Polymer; Propagation loss; Pulsed laser deposition; Refractive index; Semiconductor; Waveguide

Indexed keywords


EID: 82455174144     PISSN: 0371750X     EISSN: 21655456     Source Type: Journal    
DOI: 10.1080/0371750X.2010.11090838     Document Type: Article
Times cited : (5)

References (106)
  • 11
    • 85024199563 scopus 로고    scopus 로고
    • Advantages of Radio Frequency Plasma Enhanced Evaporation Compared to Other Coating Techniques Optical Interference Coatings
    • Optical Society of America, Tuscan, Arizona, USA
    • W., Schwärzler, U., Frick, R., Marx and D., Gary, “Advantages of Radio Frequency Plasma Enhanced Evaporation Compared to Other Coating Techniques”, in:Optical Interference Coatings, OSA Technical Digest (CD), paper TuEPDP3, Optical Society of America, Tuscan, Arizona, USA (2007).
    • (2007) OSA Technical Digest (CD), paper TuEPDP3
    • Schwärzler, W.1    Frick, U.2    Marx, R.3    Gary, D.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.