Fabrication of Si-based waveguide splitters using photosensitive sol-gel method

Optics Communications

Volumn 282, Issue 7, 2009, Pages 1307-1311

  Wang, Zhezhe ^a   Zhao, Gaoyang ^a   Zhang, Xiaolei ^a   Lei, Ying ^a  

^a XI'AN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Optical splitters; PMMA; Sol gel photosensitive; Y branch

Indexed keywords

CLADDING (COATING); DISSOLUTION; ESTERS; FABRICATION; GELATION; GELS; LIGHT SENSITIVE MATERIALS; METALLIC FILMS; OPTICAL WAVEGUIDES; PHOTORESISTS; PHOTOSENSITIVITY; REFRACTIVE INDEX; SILICON; SILICON COMPOUNDS; SOL-GEL PROCESS; SOL-GELS; SOLS; STRUCTURE (COMPOSITION); SUBSTRATES; WAVEGUIDES; YTTRIUM ALLOYS; ZIRCONIUM ALLOYS;

DIP COATINGS; GEL FILMS; IRRADIATED AREAS; LINE WIDTHS; NEAR-FIELD PATTERNS; OPTICAL POWER SPLITTERS; OPTICAL SPLITTERS; ORGANIC-INORGANIC COMPOSITES; PMMA; POLYMETHYLMETHACRYLATE; ROOT-MEAN-SQUARE ROUGHNESS; SI SUBSTRATES; SI-BASED; SOL-GEL METHODS; SOL-GEL PHOTOSENSITIVE; SPECTROSCOPIC ELLIPSOMETER; UV LIGHTS; UV PHOTOSENSITIVE; WAVEGUIDE SPLITTERS; Y-BRANCH;

COLLOIDS;

EID: 59749088587     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2008.11.066     Document Type: Article

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