A parametric study of Er3+-ions doped Phospho-tellurite glass thin films by pulsed laser deposition

Optical Materials

Volumn 33, Issue 2, 2010, Pages 215-219

  Irannejad, M ^a   Jose, G ^a   Jha, A ^a   Steenson, D P ^a  

^a UNIVERSITY OF LEEDS   (United Kingdom)

Author keywords

Erbium doped phospho tellurite glass; Glass thin films; Propagation loss; Pulsed laser deposition

Indexed keywords

ERBIUM COMPOUNDS; FLUORINE COMPOUNDS; GLASS; OPTICAL WAVEGUIDES; PULSED LASER DEPOSITION; PULSED LASERS; REFRACTIVE INDEX; SILICA; SUBSTRATES; TELLURIUM COMPOUNDS;

GLASS THIN FILMS; INTEGRATED ACTIVE OPTICAL DEVICES; PHOSPHO-TELLURITE GLASS; PROPAGATION LOSS; SILICA SUBSTRATE; STOICHIOMETRIC TRANSFER; SUBSTRATE TEMPERATURE; TARGET TO SUBSTRATE DISTANCE;

THIN FILMS;

EID: 78649686681     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2010.08.017     Document Type: Article

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