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Volumn 4, Issue 5, 2009, Pages 393-398
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Synthesis of isotopically controlled metal-catalyzed silicon nanowires
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Author keywords
Chemical vapor deposition; Epitaxy; Metal catalyzed growth; Nanowires; Semiconductor; Stable isotopes
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Indexed keywords
EPITAXY;
FUNDAMENTAL PROPERTIES;
ISOTOPIC COMPOSITION;
ISOTOPICALLY ENRICHED;
LO PHONONS;
NANO SCALE;
NEW OPPORTUNITIES;
SEMICONDUCTOR;
SI NANOWIRE;
SILANE PRECURSOR;
SILICON NANOWIRES;
SILICON SUBSTRATES;
STABLE ISOTOPES;
VAPOR-LIQUID-SOLID MECHANISM;
CENTRIFUGATION;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL GROWTH;
ELECTRIC WIRE;
ISOTOPES;
NANOWIRES;
SEMICONDUCTOR GROWTH;
SILANES;
SYNTHESIS (CHEMICAL);
VAPORS;
SILICON;
METAL;
NANOWIRE;
SILICON DERIVATIVE;
ARTICLE;
CATALYSIS;
CHEMICAL COMPOSITION;
DEVICE;
LIQUID;
MOLECULAR ELECTRONICS;
PHONON;
SOLID;
SYNTHESIS;
VAPOR;
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EID: 70349260087
PISSN: 17480132
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nantod.2009.08.009 Document Type: Article |
Times cited : (20)
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References (35)
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