Investigations on Sn-doped Ni oxide thin films and their use as optical sensor devices

Journal of Non-Crystalline Solids

Volumn 358, Issue 2, 2012, Pages 285-289

  Dakhel, A A ^a  

^a UNIVERSITY OF BAHRAIN   (Bahrain)

Author keywords

MOS structure; Ni oxide; Sn doped NiO

Indexed keywords

CRYSTALLINE STRUCTURE; DC ELECTRICAL; EXPERIMENTAL DATA; INSULATING PROPERTIES; MOS STRUCTURE; NI OXIDE; NIO FILMS; NIO THIN FILM; OPTICAL AND ELECTRICAL PROPERTIES; OPTICAL BEHAVIOUR; OPTICAL SENSOR DEVICES; SILICON SUBSTRATES; SN-DOPED; THERMAL OXIDATION; VACUUM DEPOSITED FILMS; WIDE BAND SEMICONDUCTORS; X RAY FLUORESCENCE;

ELECTRIC PROPERTIES; FILM PREPARATION; MOS DEVICES; OXIDE FILMS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SENSORS; THIN FILMS; X RAY DIFFRACTION;

TIN;

EID: 81855222061     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2011.09.028     Document Type: Article

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