Electrical properties of Li-doped NiO films

Journal of the European Ceramic Society

Volumn 30, Issue 2, 2010, Pages 503-508

  Jang, Wei Luen ^a   Lu, Yang Ming ^b   Hwang, Weng Sing ^a   Chen, Wei Chien ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NATIONAL UNIVERSITY OF TAINAN   (Taiwan)

Author keywords

Electrical properties; Electrical stability; Li doped; NiO

Indexed keywords

ELECTRICAL CONDUCTIVITY; ELECTRICAL PROPERTIES; ELECTRICAL PROPERTY; ELECTRICAL RESISTANCES; ELECTRICAL STABILITY; FILM SURFACES; GLASS SUBSTRATES; LI CONTENT; LI-DOPED; LI-DOPED NIO; NIO; NIO FILMS; RADIO FREQUENCY MAGNETRON SPUTTERING;

ELECTRIC CONDUCTIVITY; INDUCTIVELY COUPLED PLASMA; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; VACANCIES;

LITHIUM;

EID: 70449528769     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2009.05.041     Document Type: Article

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