UV-visible studies of nickel oxide thin film grown by thermal oxidation of nickel

Physica B: Condensed Matter

Volumn 405, Issue 12, 2010, Pages 2711-2714

  Mohanty, P ^a,c   Rath, Chandana ^a   Mallick, P ^b   Biswal, R ^c   Mishra, N C ^c  

^a BANARAS HINDU UNIVERSITY   (India)

^b NORTH ORISSA UNIVERSITY   (India)

^c UTKAL UNIVERSITY   (India)

Author keywords

Band gap; Thin films; UV visible spectroscopy

Indexed keywords

ABSORBANCE BANDS; ABSORBANCE SPECTRUM; BAND GAP; BAND GAP ENERGY; BAND GAPS; COATED GLASS SUBSTRATES; DESTRUCTIVE INTERFERENCE; ELECTRICAL PROPERTY; EXPERIMENTAL STUDIES; NICKEL OXIDE THIN FILMS; OPTICAL BAND GAP ENERGY; OXYGEN ATMOSPHERE; PHASE FORMATIONS; REFLECTED BEAM; SMALL OSCILLATIONS; THERMAL OXIDATION; TIN DOPED INDIUM OXIDE; UV VISIBLE SPECTROSCOPY; UV-VISIBLE; XRD; XRD ANALYSIS;

ELECTRIC PROPERTIES; ENERGY GAP; INDIUM; INFRARED SPECTROPHOTOMETERS; ITO GLASS; NICKEL; NICKEL ALLOYS; OPTICAL PROPERTIES; OXIDATION; OXYGEN; SUBSTRATES; THIN FILMS; TIN; TITANIUM COMPOUNDS; ULTRAVIOLET SPECTROSCOPY; VAPOR DEPOSITION;

NICKEL OXIDE;

EID: 77953135341     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2010.03.064     Document Type: Article

References (34)

1. Tao D., and Wei F. Mater. Lett. 58 (2004) 3226
2. Hotovy I., Huran J., and Spiess L. J. Mater. Sci. 39 (2004) 2609
3. Wu L., Wu Y., Wei H., Shi Y., and Hu C. Mater. Lett. 58 (2004) 2700
4. Fujii E., Tomozawa A., Torii H., and Takayama R. Jpn. J. Appl. Phys. 35 (1996) L328
5. Sato H., Minami T., Takata S., and Yamada T. Thin Solid Films 236 (1993) 27
6. Kitao M., Izawa K., Urabe K., Komatsu T., Kuwano S., and Yamada S. Jpn. J. Appl. Phys. 33 (1994) 6656
7. Yoshimura K., Miki T., and Tanemura S. Jpn. J. Appl. Phys. 34 (1995) 2440
8. Kumagai H., Matsumoto M., Toyoda K., and Obara M. J. Mater. Sci. Lett. 15 (1996) 1081
9. Sasi B., Gopchandran K.G., Manoj P.K., Koshy P., Prabhakara Rao P., and Vaidyan V.K. Vacuum 68 (2003) 149
10. Ahn K.-S., Nah Y.C., and Sung Y.E. Appl. Surf. Sci. 199 (2002) 259
11. Azens A., Kullman L., Vaivars G., Nordborg H., and Granqvist C.G. Solid State Ionics 449 (1998) 113
12. Mahmoud S.A., Akl A.A., Kamal H., and Abdel-Hady K. Physica B 311 (2002) 366
13. Cerc Korošec R., Bukovec P., Pihlar B., and Gomilšek J.P.a. Thermochim. Acta 57 (2003) 402
14. Kang J.K., and Rhee S.W. Thin Solid Films 57 (2001) 391
15. Nakaoka K., Ueyam J., and Agura K. J. Electroanal. Chem. 93 (2004) 571
16. Ristova M., Velevska J., and Ristov M. Sol. Energy Mater. Sol. Cells 71 (2002) 219
17. Tachiki M., Hosomi T., and Kobayashi T. Jpn. J. Appl. Phys. 39 (2000) 1817
18. Wang S.Y., Wang W., Wang W.Z., and Du Y.W. Mater. Sci. Eng. B 90 (2002) 133
19. Bidoult M., Maglione M., Kchikech A., and M. Phys. Rev. B 52 (1995) 4195
20. Wu J., Nan C.W., Lin Y., and Deng Y. Phys. Rev. Lett. 89 (2002) 217601
21. Kodama R.H., Makhlouf S.A., and Berkowitz A.E. Phys. Rev. Lett. 79 (1997) 1393
22. Wells A.F. Structural Inorganic Chemistry. 5th ed. (1984), Clarendon Press, Oxford p. 538
23. Antolini E. J. Mater. Sci. 27 (1992) 3335
24. Nolting W., Haunert L., and Borstel G. Phys. Rev. B 46 (1992) 4426
25. Bengone O., Alouani M., ochl P.B.l., and Hugel J. Phys. Rev. B 62 (2000) 16392
26. Zhang K., Rossi C., Alphonse P., and Tenailleau C. Nanotechnology 19 (2008) 1432
27. Kubelka P., and Munk F. Z. Tech. Phys. 12 (1931) 593
28. J. Torrent, V. Barr ́on, Encyclopedia of Surface and Colloid Science, (Marcel Dekker, Inc., New York 2002.
29. Smith R.A. Semiconductors. 2nd ed. (1978), Cambridge University Press, Cambridge
30. Han H., Mayer J.W., and Alford T.L. J. Appl. Phys. 100 (2006) 083715
31. C..Kittel, Introduction to Solid State Physics, 7th ed., John Wiley & Sons (Asia) Pte Ltd, 1996.
32. Hartnagel H. Semiconducting Transparent Thin Films (1995), Institute of Physics Pub., Bristol [England]
33. Zhang Z., Zhao Y., and Zhu M. Appl. Phys. Lett. 88 (2006) 033101
34. Lin Y., Xie T., Cheng B.C., Geng B.Y., and Zhang L.D. Chem. Phys. Lett. 380 (2003) 521