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Microelectronic Engineering

Volumn 88, Issue 12, 2011, Pages 3437-3441

Control of sonoluminescence signal in deionized water using carbon dioxide

(7) Kumari, S a Keswani, M a Singh, S b Beck, M c Liebscher, E c Deymier, P a Raghavan, S a

a University of Arizona (United States)

b University of Arizona (United States)

c Product Systems Incorporation (United States)

Author keywords

Acoustic cavitation; Carbon dioxide; Cavitation threshold; Megasonic cleaning; Sonoluminescence; Wafer damage

Indexed keywords

ACOUSTIC CAVITATIONS; CARBONIC ACIDS; CAVITATION THRESHOLD; CHEMICAL METHOD; DUTY CYCLES; IN-PROCESS; IN-SITU; MEGASONIC CLEANING; MEGASONICS; POTENT INHIBITOR; POWER DENSITIES; SEMICONDUCTOR INDUSTRY; TRANSIENT CAVITATION; WAFER DAMAGE;

CARBON; CARBON DIOXIDE; CARBON DIOXIDE PROCESS; CAVITATION; DEIONIZED WATER; ORGANIC ACIDS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; SONOCHEMISTRY; SONOLUMINESCENCE;

CLEANING;

EID: 81855166695 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2010.10.036 Document Type: Article

Times cited : (28)

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