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Volumn 6283 II, Issue , 2006, Pages

Megasonic cleaning, cavitation, and substrate damage: An atomistic approach

Author keywords

Cavitation; Megasonics; Photomask cleaning

Indexed keywords

MEGASONICS; PHOTOMASK CLEANING; TWO-DIMENSIONAL ATOMISTIC MODEL;

EID: 33748052363     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681771     Document Type: Conference Paper
Times cited : (27)

References (12)
  • 1
    • 0035317128 scopus 로고    scopus 로고
    • Getting more from moore's
    • G. Stix, "Getting more from moore's," Scientific American 284, p. 32, 2001.
    • (2001) Scientific American , vol.284 , pp. 32
    • Stix, G.1
  • 2
    • 0029358119 scopus 로고
    • An experimental-study of megasonic cleaning of silicon-wafers
    • A. A. Busnaina, I. I. Kashkoush, and G. W. Gale, "An experimental-study of megasonic cleaning of silicon-wafers," J. Electrochem. Soc. 142, p. 2812, 1995.
    • (1995) J. Electrochem. Soc. , vol.142 , pp. 2812
    • Busnaina, A.A.1    Kashkoush, I.I.2    Gale, G.W.3
  • 5
    • 85012738841 scopus 로고
    • Acoustic streaming
    • W. P. Mason, ed., Academic, London
    • W. L. Nyborg, "Acoustic streaming," in Physical Acoustics - Vol. II B, W. P. Mason, ed., pp. 265-331, Academic, London, 1965.
    • (1965) Physical Acoustics - Vol. II B , vol.2 B , pp. 265-331
    • Nyborg, W.L.1
  • 6
    • 0003817720 scopus 로고
    • McGraw-Hill, London
    • F. R. Young, Cavitation, McGraw-Hill, London, 1989.
    • (1989) Cavitation
    • Young, F.R.1
  • 8
    • 33644602148 scopus 로고    scopus 로고
    • Acoustic streaming effects in megasonic cleaning of euv photomasks: A continuum model
    • 25th Annual BACUS Symposium on Photomask Technology, J. T. Weed and P. M. Martin, eds.
    • V. Kapila, P. A. Deymier, H. Shende, V. Pandit, S. Raghavan, and F. O. Eschbach, "Acoustic streaming effects in megasonic cleaning of euv photomasks: A continuum model," in 25th Annual BACUS Symposium on Photomask Technology, J. T. Weed and P. M. Martin, eds., Proc. SPIE 5992, pp. 59923X-1, 2005.
    • (2005) Proc. SPIE , vol.5992
    • Kapila, V.1    Deymier, P.A.2    Shende, H.3    Pandit, V.4    Raghavan, S.5    Eschbach, F.O.6
  • 10
    • 18144420369 scopus 로고    scopus 로고
    • Damage free cleaning beyond 6.5 nm
    • A. Hand, "Damage free cleaning beyond 6.5 nm," Semiconductor International Jan. 2005.
    • Semiconductor International , vol.JAN. 2005
    • Hand, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.