Evaluation of megasonic cleaning for sub-90-nm technologies

Solid State Phenomena

Volumn 103-104, Issue , 2005, Pages 141-146

  Vereecke, G ^a   Holsteyns, F ^a   Arnauts, S ^a   Beckx, S ^a   Jaenen, P ^a   Kenis, K ^a   Lismont, M ^a   Lux, M ^a   Vos, R ^a   Snow, J ^a   Mertens, P W ^a  

^a IMEC   (Belgium)

Author keywords

Damage; Megasonic cleaning; Nanoparticles

Indexed keywords

BIOASSAY; EFFICIENCY; NANOPARTICLES; SEMICONDUCTOR DEVICE MANUFACTURE; TEMPERATURE;

CLEANING EFFICIENCY; CLEANING SOLUTION; DAMAGE; LOW TEMPERATURES; MEGASONIC CLEANING; PARTICLE REMOVAL EFFICIENCY; SEMICONDUCTOR MANUFACTURING; SUB-90NM TECHNOLOGIES;

CLEANING;

EID: 33745867097     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.103-104.141     Document Type: Conference Paper

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