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Volumn 15, Issue 3-4, 1997, Pages 361-369

Removal of silica particles from silicon substrates using megasonic cleaning

Author keywords

[No Author keywords available]

Indexed keywords

SILICON;

EID: 0031391561     PISSN: 02726351     EISSN: 15480046     Source Type: Journal    
DOI: 10.1080/02726359708906776     Document Type: Article
Times cited : (10)

References (20)
  • 1
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    • J. Olaf, Oberflächenreinigung mit Ultraschall, Acustica, Vol. 7, No. 5, p. 253 1957.
    • (1957) Acustica , vol.7 , Issue.5 , pp. 253
    • Larsen, J.1    Olaf, A.2
  • 2
    • 0345795813 scopus 로고
    • On the Physics of Ultrasonic Cleaning, Ultrasonic News
    • L. D. Rosenberg, On the Physics of Ultrasonic Cleaning, Ultrasonic News, Winter, p. 16, 1960.
    • (1960) Winter , pp. 16
    • Larsen, L.D.1    Rosenberg, A.2
  • 3
    • 0000772423 scopus 로고
    • Frequency Dependence of Ultrasonic Cleaning
    • D. H. McQueen, Frequency Dependence of Ultrasonic Cleaning, Ultrasonics, Vol. 24, 9, p. 273, 1986.
    • (1986) Ultrasonics , vol.24 , Issue.9 , pp. 273
    • McQueen, D.H.1
  • 4
    • 0025513732 scopus 로고
    • Ultrasonically Enhanced Chemical Dissociation from Solid Surfaces with Application to Cleaning Electronic Circuit Boards
    • D. H. McQueen, Ultrasonically Enhanced Chemical Dissociation from Solid Surfaces with Application to Cleaning Electronic Circuit Boards, Ultrasonics, Vol. 28, 11, p. 422, 1990.
    • (1990) Ultrasonics , vol.28 , Issue.11 , pp. 422
    • McQueen, D.H.1
  • 5
    • 0022029193 scopus 로고
    • Megasonic Particle Removal from Solid-State Wafers
    • S. Schwartzman, A. Mayer, and W. Kern, Megasonic Particle Removal from Solid-State Wafers, RCA Review, Vol. 46, 3, p. 81, 1985.
    • (1985) RCA Review , vol.46 , Issue.3 , pp. 81
    • Schwartzman, S.1    Mayer, A.2    Kern, W.3
  • 7
    • 0018541959 scopus 로고
    • Megasonic Cleaning: A New Cleaning and Drying System
    • A. Mayer, and S. Schwartzman, Megasonic Cleaning: A New Cleaning and Drying System for Use in Semiconductor Processing, J. Electronic Materials, Vol. 8, p. 855, 1979.
    • (1979) J. Electronic Materials , vol.8 , pp. 855
    • Mayer, A.1    Schwartzman, S.2
  • 10
    • 1542672590 scopus 로고
    • Submicron Particle Removal Using Ultrasonic Cleaning
    • I. Kashkoush, and A. Busnaina, Submicron Particle Removal Using Ultrasonic Cleaning, J. of Particulate Sci. Tech., Vol. 11, p. II, 1993.
    • (1993) J. of Particulate Sci. Tech. , vol.11 , pp. 2
    • Kashkoush, I.1    Busnaina, A.2
  • 11
    • 0027791012 scopus 로고
    • The Effect of Time, Temperature and Particle Size on Submicron Particle Removal Using Ultrasonic Cleaning
    • A. Busnaina, and I. Kashkoush, The Effect of Time, Temperature and Particle Size on Submicron Particle Removal Using Ultrasonic Cleaning, Chem. Eng. Comm., Vol. 125, p. 47, 1993.
    • (1993) Chem. Eng. Comm. , vol.125 , pp. 47
    • Busnaina, A.1    Kashkoush, I.2
  • 13
    • 3543114012 scopus 로고
    • The Use of Acoustic Streaming in the Removal of Submicron Particles from Silicon Substrates
    • Clarkson University, Potsdam, NY
    • I. Kashkoush, The Use of Acoustic Streaming in the Removal of Submicron Particles from Silicon Substrates, Ph. D. Thesis, Clarkson University, Potsdam, NY 1993.
    • (1993) Ph. D. Thesis
    • Kashkoush, I.1
  • 16
    • 0037568462 scopus 로고
    • Clean and Damage-Free GaAs Surfaces Prepared by Ultrasonic Running Deionized Water Treatment
    • Y. Hirota, Clean and Damage-Free GaAs Surfaces Prepared by Ultrasonic Running Deionized Water Treatment, Applied Surface Science, Vol. 60, p. 619, 1992.
    • (1992) Applied Surface Science , vol.60 , pp. 619
    • Hirota, Y.1
  • 19
    • 0000547993 scopus 로고
    • Chemical Action ofPulsed Ultrasound: Observation of an Unprecedented Intensity Effect
    • M. Gutiénrez, and A. Henglein, Chemical Action ofPulsed Ultrasound: Observation of an Unprecedented Intensity Effect, J. Phys. Chem., Vol. 94, P. 3625, 1990.
    • (1990) J. Phys. Chem. , vol.94 , pp. 3625
    • Larsen, M.1    Gutiénrez, A.2    Henglein, A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.