Streaming and removal forces due to second-order sound field during megasonic cleaning of silicon wafers

Journal of Applied Physics

Volumn 88, Issue 11, 2000, Pages 6821-6835

  Deymier, P A ^a   Vasseur, J O ^b   Khelif, A ^b   Djafari Rouhani, B ^b   Dobrzynski, L ^b   Raghavan, S ^a  

^a University of Arizona   (United States)

^b UNIV LILLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009057123     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1323521     Document Type: Article

References (23)

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