SCOPUS 정보 검색 플랫폼

ECS Transactions

Volumn 25, Issue 5, 2009, Pages 295-302

Megasonic metrology for enhanced process development

(7) Kumari, S a Keswani, M a Beck, M b Liebscher, E b Liang, T c Deymier, P a Raghavan, S a

a University of Arizona (United States)

b Product Systems Incorporation (United States)

c INTEL CORPORATION (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; CAVITATION; DISSOLUTION; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES; SILICON WAFERS; SONOCHEMISTRY;

ACOUSTIC CAVITATIONS; CAVITATION THRESHOLDS; CONTROLLED CONDITIONS; MEGASONIC CLEANING; PRECISE CONTROL; PRIMARY SOURCES; PROCESS DEVELOPMENT; REMOVAL KINETICS;

CLEANING;

EID: 74949098169 PISSN: 19385862 EISSN: 19386737 Source Type: Conference Proceeding
DOI: 10.1149/1.3202666 Document Type: Conference Paper

Times cited : (11)

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