X-ray radiation damage of organic semiconductor thin films during grazing incidence diffraction experiments

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 284, Issue , 2012, Pages 64-68

  Neuhold, A ^a   Novak J ^a   Flesch, H G ^a   Moser, A ^a   Djuric, T ^a   Grodd, L ^b   Grigorian, S ^b   Pietsch, U ^b   Resel, R ^a  

^a GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^b UNIVERSITY OF SIEGEN   (Germany)

Author keywords

Fluence; Grazing incidence X ray diffraction; Organic semiconductor; Radiation damage

Indexed keywords

AVERAGE FLUX; BRAGG PEAKS; CHEMICAL COMPONENT; CRYSTALLINITIES; FLUENCES; GRAZING INCIDENCE DIFFRACTION; GRAZING INCIDENCE X-RAY DIFFRACTION; ORGANIC MATERIALS; ORGANIC SEMICONDUCTING MATERIALS; ORGANIC SEMICONDUCTOR THIN FILMS; ORGANIC THIN FILMS; PENTACENES; POLY-3-HEXYLTHIOPHENE; SEMICRYSTALLINES; SEXITHIOPHENES; SOFT MATTER; SPECULAR X-RAY REFLECTIVITIES; SYNCHROTRON X-RAY RADIATION; X RAY BEAM;

CRYSTALLINE MATERIALS; MOLECULAR CRYSTALS; RADIATION DAMAGE; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION; X RAY PRODUCTION;

SEMICONDUCTING ORGANIC COMPOUNDS;

EID: 81155124096     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2011.07.105     Document Type: Article

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