Synchrotron X-ray induced damage in polymer (PS) thin films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 10, 2009, Pages 1807-1810

  Bhatta, Umananda M ^a   Ghatak, J ^a   Mukhopadhyay, M ^b,c   Wang, Jin ^b   Narayanan, Suresh ^b   Satyam, P V ^a  

^a INSTITUTE OF PHYSICS   (India)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Polymer films; Radiation damage; Thin films; X ray reflectivity

Indexed keywords

CR FILMS; FLUENCE RANGES; INTERFACIAL ROUGHNESS; METALLIC LAYERS; POLYSTYRENE FILMS; SECONDARY ELECTRONS; SILICON SUBSTRATES; SYNCHROTRON X-RAYS; THIN LAYERS; X-RAY REFLECTIVITY;

CHROMIUM; MULTIPHOTON PROCESSES; PHOTOIONIZATION; PHOTONS; PLASTIC FILMS; POLYMERS; POLYSTYRENES; RADIATION DAMAGE; REFLECTION; SEMICONDUCTING SILICON COMPOUNDS; SUPRAMOLECULAR CHEMISTRY; SYNCHROTRONS; THIN FILMS; X RAY DIFFRACTION; X RAYS;

POLYMER FILMS;

EID: 65449167229     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2009.01.130     Document Type: Article

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