Thermal processing and native oxidation of silicon nanoparticles

Journal of Nanoparticle Research

Volumn 13, Issue 10, 2011, Pages 5473-5484

  Winters, Brandon J ^a   Holm, Jason ^a   Roberts, Jeffrey T ^b  

^a UNIVERSITY OF MINNESOTA   (United States)

^b PURDUE UNIVERSITY   (United States)

Author keywords

Ambient oxidation; Deuterium; Native oxidation; Silicon nanoparticle; Synthesis; Thermal desorption

Indexed keywords

ADSORBED HYDROGEN; AMBIENT OXIDATION; CARRIER GAS; FTIR; HIGH PROCESSING TEMPERATURES; HYDROGEN CONTENTS; INITIAL OXIDATION; NATIVE OXIDATION; OXIDE LAYER; RF PLASMA; SILICON NANOPARTICLE; SILICON NANOPARTICLES; SURFACE HYDRIDES; SURFACE HYDROGEN;

DEUTERIUM; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISSIPATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; INERT GASES; NANOPARTICLES; OXIDATION; PHOTOELECTRON SPECTROSCOPY; PROCESSING; REACTION INTERMEDIATES; SURFACE CHEMISTRY; THERMAL DESORPTION; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON OXIDES;

DEUTERIUM; HYDROGEN; NANOPARTICLE; SILICON; SILICON NANOPARTICLE; UNCLASSIFIED DRUG;

ADSORPTION; ARTICLE; ELECTRON ENERGY LOSS SPECTROSCOPY; FOURIER TRANSFORMATION; INFRARED SPECTROSCOPY; NANOTECHNOLOGY; OXIDATION; PARTICLE SIZE; PRIORITY JOURNAL; SYNTHESIS; TEMPERATURE; THERMAL ANALYSIS;

EID: 80955158571     PISSN: 13880764     EISSN: 1572896X     Source Type: Journal    
DOI: 10.1007/s11051-011-0535-4     Document Type: Article

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