Oxidation study of silicon nanoparticle thin films on HOPG

Surface Science

Volumn 603, Issue 19, 2009, Pages 2999-3004

  Klauser, F ^a   Stijepovic, R ^a   Endstrasser, N ^a   Jaksch, S ^a   Memmel, N ^a   Scheier, P ^a  

^a UNIVERSITY OF INNSBRUCK   (Austria)

Author keywords

Depth profile; Magnetron sputtering; Nanoparticles; Oxidation; Silicon; STM; Thin film; XPS

Indexed keywords

AMBIENT AIR CONDITIONS; ARGON-OXYGEN MIXTURES; DC MAGNETRON SPUTTERING; DEPTH PROFILE; FILM SURFACES; FILM/SUBSTRATE INTERFACE; HIGHLY ORIENTED PYROLYTIC GRAPHITE; INTERFACE FORMATION; LOW OXIDATION STATE; OXIDIZED SILICON; OXIDIZED SURFACES; OXYGEN CONCENTRATIONS; OXYGEN PLASMAS; OXYGEN SURFACE; OXYGEN TREATMENT; POST-DEPOSITION; REACTIVE MAGNETRON SPUTTERING; ROOM TEMPERATURE OXIDATION; SILICON NANOPARTICLES; SPUTTER GAS; SPUTTER-DEPTH PROFILING; STM; XPS;

ARGON; DEPTH PROFILING; GRAPHITE; MAGNETRON SPUTTERING; MAGNETRONS; NANOPARTICLES; OXIDATION; OXYGEN; PLASMA DEPOSITION; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SILICON CARBIDE; THIN FILM DEVICES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON OXIDES;

EID: 70349086943     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2009.08.007     Document Type: Article

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