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Thin Solid Films

Volumn 520, Issue 2, 2011, Pages 734-738

The preparation and properties of Y2O3/AlN anti-reflection films on chemical vapor deposition diamond

(3) Yan, Feng a Liu, Zhengtang a Liu, Wenting a

a NORTHWESTERN POLYTECHNICAL UNIVERSITY (China)

Author keywords

Aluminum nitride; Anti reflection film; Chemical vapor deposition diamond; Yttrium trioxide

Indexed keywords

ADHESION IMPROVEMENT; ALN; ALN FILMS; ANTI-OXIDATION; ANTI-REFLECTION; ANTIREFLECTION FILMS; CERAMIC TARGET; CHEMICAL VAPOR DEPOSITION DIAMOND; CVD DIAMOND; FOURIER TRANSFORM INFRARED SPECTROMETER; OPTICAL QUALITIES; PREPARATION AND PROPERTIES; PURE AL; RF-MAGNETRON SPUTTERING; SCATTERING LOSS; TRANSMISSION ENHANCEMENT; WAVEBANDS;

ALUMINUM; ALUMINUM COATINGS; ALUMINUM NITRIDE; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; DIAMONDS; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; MAGNETRON SPUTTERING; NITRIDES; PHOTOELECTRON SPECTROSCOPY; SPECTROMETERS; SPECTROSCOPIC ELLIPSOMETRY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM; YTTRIUM OXIDE;

YTTRIUM ALLOYS;

EID: 80755153746 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.04.119 Document Type: Conference Paper

Times cited : (21)

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