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Volumn 19, Issue 7, 2011, Pages 787-793

Transport properties of p-type compensated silicon at room temperature

Author keywords

compensation; electron; Hall Factor; hole; mobility; silicon

Indexed keywords

CARRIER RECOMBINATION; EXPERIMENTAL DATA; HALL FACTOR; HOLE; MINORITY-CARRIER MOBILITY; MOBILITY MODEL; P-TYPE; ROOM TEMPERATURE; SCATTERING MECHANISMS;

EID: 80054949322     PISSN: 10627995     EISSN: 1099159X     Source Type: Journal    
DOI: 10.1002/pip.1036     Document Type: Article
Times cited : (17)

References (31)
  • 2
    • 0019541513 scopus 로고
    • An improved model for analyzing hole mobility and resistivity in P-type silicon doped with boron, gallium, and indium
    • Linares LC, Li SS,. An improved model for analyzing hole mobility and resistivity in P-type silicon doped with boron, gallium, and indium. Journal of the Electrochemical Society 1981; 128: 601-608. (Pubitemid 11501783)
    • (1981) Journal of the Electrochemical Society , vol.128 , Issue.3 , pp. 601-608
    • Linares, L.C.1    Li, S.S.2
  • 3
    • 0026899752 scopus 로고
    • Unified mobility model for device simulation. II. Temperature dependence of carrier mobility and lifetime
    • Klaassen DBM,. A unified mobility model for device simulation-II. Temperature dependence of carrier mobility and lifetime. Solid-State Electronics 1992; 35: 961-967. (Pubitemid 23567458)
    • (1992) Solid-State Electronics , vol.35 , Issue.7 , pp. 961-967
    • Klaassen, D.B.M.1
  • 4
    • 0026899612 scopus 로고
    • Unified mobility model for device simulation. I. Model equations and concentration dependence
    • Klaassen DBM,. A unified mobility model for device simulation-I. Model equations and concentration dependence. Solid-State Electronics 1992; 35: 953-959. (Pubitemid 23567459)
    • (1992) Solid-State Electronics , vol.35 , Issue.7 , pp. 953-959
    • Klaassen, D.B.M.1
  • 7
    • 71949084534 scopus 로고    scopus 로고
    • Impact of dopant compensation on the deactivation of boron-oxygen recombination centers in crystalline silicon
    • Lim B, Liu A, Macdonald D, Bothe K, Schmidt J,. Impact of dopant compensation on the deactivation of boron-oxygen recombination centers in crystalline silicon. Applied Physics Letters 2009; 95: 232109.
    • (2009) Applied Physics Letters , vol.95 , pp. 232109
    • Lim, B.1    Liu, A.2    MacDonald, D.3    Bothe, K.4    Schmidt, J.5
  • 9
    • 48249151470 scopus 로고    scopus 로고
    • Effects of the compensation level on the carrier lifetime of crystalline silicon
    • Dubois S, Enjalbert N, Garandet JP,. Effects of the compensation level on the carrier lifetime of crystalline silicon. Applied Physics Letters 2008; 93: 032114.
    • (2008) Applied Physics Letters , vol.93 , pp. 032114
    • Dubois, S.1    Enjalbert, N.2    Garandet, J.P.3
  • 11
    • 0021500385 scopus 로고
    • On the effect of impurities on the photovoltaic behavior of solar-grade silicon
    • Pizzini S, Calligarich C,. On the effect of impurities on the photovoltaic behavior of solar-grade silicon.1. The role of boron and phosphorus primary impurities in P-type single-crystal silicon. Journal of the Electrochemical Society 1984; 131: 2128-2132. (Pubitemid 14622637)
    • (1984) Journal of the Electrochemical Society , vol.131 , Issue.9 , pp. 2128-2132
    • Pizzini, S.1    Calligarich, C.2
  • 12
    • 0016597193 scopus 로고
    • The electrical properties of polycrystalline silicon films
    • Seto JYW,. The electrical properties of polycrystalline silicon films. Journal of Applied Physics 1975; 46: 5247-5254.
    • (1975) Journal of Applied Physics , vol.46 , pp. 5247-5254
    • Seto, J.Y.W.1
  • 14
    • 0020783138 scopus 로고
    • Modeling of carrier mobility against carrier concentration in arsenic-doped, phosphorus-doped, and boron-doped silicon
    • Masetti G, Severi M, Solmi S,. Modeling of carrier mobility against carrier concentration in arsenic-doped, phosphorus-doped, and boron-doped silicon. IEE Transactions on Electron Devices 1983; 30: 764-769. (Pubitemid 13588640)
    • (1983) IEEE Transactions on Electron Devices , vol.ED-30 , Issue.7 , pp. 764-769
    • Masetti Guido1    Severi Maurizio2    Solmi Sandro3
  • 15
    • 0020087475 scopus 로고
    • Electron and hole mobilities in silicon as a function of concentration and temperature
    • Arora ND, Hauser JR, Roulston DJ,. Electron and hole mobilities in silicon as a function of concentration and temperature. IEE Transactions on Electron Devices 1982; 29: 292-295.
    • (1982) IEE Transactions on Electron Devices , vol.29 , pp. 292-295
    • Arora, N.D.1    Hauser, J.R.2    Roulston, D.J.3
  • 16
    • 0019608025 scopus 로고
    • Carrier mobilities in silicon semi-empirically related to temperature, doping and injection level
    • Dorkel JM, Leturcq P,. Carrier mobilities in silicon semi-empirically related to temperature, doping and injection level. Solid-State Electronics 1981; 24: 821-825. (Pubitemid 12462240)
    • (1981) Solid-State Electronics , vol.24 , Issue.9 , pp. 821-825
    • Dorkel, J.M.1    Leturcq, Ph.2
  • 20
    • 0000513411 scopus 로고    scopus 로고
    • Contactless determination of current-voltage characteristics and minority-carrier lifetimes in semiconductors from quasi-steady-state photoconductance data
    • Sinton RA, Cuevas A,. Contactless determination of current-voltage characteristics and minority-carrier lifetimes in semiconductors from quasi-steady-state photoconductance data. Applied Physics Letters 1996; 69: 2510-2512. (Pubitemid 126595545)
    • (1996) Applied Physics Letters , vol.69 , Issue.17 , pp. 2510-2512
    • Sinton, R.A.1    Cuevas, A.2
  • 21
    • 0015491489 scopus 로고
    • Die abhängigkeit der trägerbeweglichkeit in silizium von der konzentration der freien ladungsträger-I
    • Dannhäuser F,. Die abhängigkeit der trägerbeweglichkeit in silizium von der konzentration der freien ladungsträger-I. Solid-State Electronics 1972; 15: 1371-1375.
    • (1972) Solid-State Electronics , vol.15 , pp. 1371-1375
    • Dannhäuser, F.1
  • 22
    • 0015490309 scopus 로고
    • Die abhängigkeit der trägerbeweglichkeit in silizium von der konzentration der freien ladungsträger-II
    • Krausse J,. Die abhängigkeit der trägerbeweglichkeit in silizium von der konzentration der freien ladungsträger-II. Solid-State Electronics 1972; 15: 1377-1381.
    • (1972) Solid-State Electronics , vol.15 , pp. 1377-1381
    • Krausse, J.1
  • 23
  • 27
    • 44349172292 scopus 로고    scopus 로고
    • Measuring dopant concentrations in compensated p-type crystalline silicon via iron-acceptor pairing
    • Macdonald D, Cuevas A, Geerligs LJ,. Measuring dopant concentrations in compensated p-type crystalline silicon via iron-acceptor pairing. Applied Physics Letters 2008; 92: 202119.
    • (2008) Applied Physics Letters , vol.92 , pp. 202119
    • MacDonald, D.1    Cuevas, A.2    Geerligs, L.J.3
  • 28
    • 35949025246 scopus 로고
    • Calculation of optical- and acoustic-phonon-limited conductivity and Hall mobilities for p-type silicon and germanium
    • Szmulowicz F,. Calculation of optical- and acoustic-phonon-limited conductivity and Hall mobilities for p-type silicon and germanium. Physical Review B 1983; 28: 5943-5963.
    • (1983) Physical Review B , vol.28 , pp. 5943-5963
    • Szmulowicz, F.1
  • 29
    • 0019608054 scopus 로고
    • Theoretical analysis of hall factor and hall mobility in p-type silicon
    • Lin JF, Li SS, Linares LC, Teng KW,. Theoretical analysis of hall factor and hall mobility in p-type silicon. Solid-State Electronics 1981; 24: 827-833. (Pubitemid 12462241)
    • (1981) Solid-State Electronics , vol.24 , Issue.9 , pp. 827-833
    • Lin, J.F.1    Li, S.S.2    Linares, L.C.3    Teng, K.W.4
  • 30
    • 0018024297 scopus 로고
    • Doping concentrations of indium-doped silicon measured by Hall, C-v, and junction-breakdown techniques
    • DOI 10.1063/1.324424
    • Schroder DK, Braggins TT, Hobgood HM,. Doping concentrations of indium-doped silicon measured by Hall, C-v, and junction-breakdown techniques. Journal of Applied Physics 1978; 49: 5256-5259. (Pubitemid 9415242)
    • (1978) J Appl Phys , vol.49 , Issue.10 , pp. 5256-5259
    • Schroder, D.K.1    Braggins, T.T.2    Hobgood, H.M.3
  • 31
    • 0346658116 scopus 로고
    • Electrical properties of silicon containing arsenic and boron
    • Morin FJ, Maita JP,. Electrical properties of silicon containing arsenic and boron. Physical Review 1954; 96: 28-35.
    • (1954) Physical Review , vol.96 , pp. 28-35
    • Morin, F.J.1    Maita, J.P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.