Ultrafast sputtered ZnO thin films with high kT for acousticwave device applications

Proceedings - IEEE Ultrasonics Symposium

Volumn , Issue , 2010, Pages 1064-1067

  Garcia Gancedo, Luis ^a   Pedros, Jorge ^b   Flewitt, Andrew J ^a   Milne, William I ^a   Ashley, Gregory M ^c   Luo, Jack ^c   Ford, Christopher J B ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c UNIVERSITY OF BOLTON   (United Kingdom)

Author keywords

HiTUS; Sputtering; Thin film; Zinc Oxide (ZnO)

Indexed keywords

CRYSTALLOGRAPHIC ORIENTATIONS; DEVICE APPLICATION; ELECTRICAL RESISTIVITY; FILM STRESS; HIGH RATE; HIGH RESISTIVITY; HIGH-FREQUENCY ACOUSTIC WAVES; HITUS; NOVEL PROCESS; PIEZOELECTRIC RESPONSE; RESONANT SPECTRUM; ULTRA-FAST; ZNO; ZNO THIN FILM; ACOUSTIC WAVE DEVICE; CRYSTALLINE ORIENTATIONS; ELECTROMECHANICAL COUPLING COEFFICIENTS; MAGNETRON SPUTTERED FILMS;

ACOUSTIC WAVES; ELECTRIC CONDUCTIVITY; PIEZOELECTRICITY; SURFACE ROUGHNESS; THIN FILMS; ULTRASONICS; ELECTROMECHANICAL COUPLING; METALLIC FILMS; OPTICAL FILMS; ZINC OXIDE;

ZINC OXIDE; ACOUSTIC WAVES;

EID: 80054072780     PISSN: 10510117     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ULTSYM.2010.5935455     Document Type: Conference Paper

References (23)

1. K. M. Laking, "A review of thin film resonator technology",IEEE Microwave magazine, Vol. 4, pp. 61-67, 2003
2. J. Kaitila, M. Ylilammi et al., "ZnO based thin films bulk acousticwave filters for EGSM band", IEEE Ultrasonics Symposium, pp. 464-467, 2001
3. G. G. Fattinger, J. Kaitila et al., "Single-to-balanced filters formobile phones using coupled resonator BAW technology", IEEE UltrasonicsSymposium, pp. 416-419, 2004
4. M. Godlewski, E. Guziewicz et al., "Monocrystalline zinc oxide filmsgrown by atomic layer deposition", Thin Solid Films, Vol. 518, pp.1145-1148, 2009
5. J.-L. Zhao, X.-M. Li et al., "Structural, optical and electricalproperties of ZnO films grown by pulsed laser deposition (PLD)", J. CrystalGrowth, Vol. 276, pp. 507-512, 2005
6. K. Haga, M. Kamidaira et al., "ZnO thin films prepared by remoteplasma-enhanced CVD method" J. Crystal Growth, Vol. 214-215, pp. 77-80,2000
7. W. L. Dang, Y.Q. Fu et al., "Deposition and characterization ofsputtered ZnO films" Superlattices & Microstructures, Vol. 42, pp.89-93, 2007
8. Y. Q. Fu, J. K. Luo et al., "Recent developments on ZnO films foracoustic wave based bio-sensing and microfluidic applications: a review,"Sens. and Act. B, Vol. 143, pp. 606-619, 2010
9. E. D. Kolb and R. A. Laudise, "Hydrothermally grown ZnO crystals oflow and intermediate resistivity," J. Am. Ceram. Soc., Vol. 49, pp.302-305, 1966
10. S.-Y. Chu, W. Water, "Influence of postdeposition annealing on theproperties of ZnO films prepared by RF magnetron sputtering," J. Europ.Ceram. Soc., Vol. 23, pp. 1593-1598, 2003
11. M. Vopsaroiu, M.J. Thwaites et al., "Novel sputteringtechnology forgrain-size control," IEEE Trans. Magn., 40, 2443-2445 (2004)
12. A. J. Flewitt, J. D. Dutson, et al., "Stability of Thin FilmTransistors Incorporating a Zinc Oxide or Indium Zinc Oxide Channel Deposited bya High Rate Sputtering Process," Semicond. Sci. Technol., 24, 085002(2009)
13. M. von Laue, Z. Krystallogr., Vol. 64, pp. 115, 1926
14. G. C. A. M. Janssen, M. M. Abdalla et al., "Celebrating the 100thanniversary of the Stoney equation for film stress: Developments frompolycrystalline steel strips to single crystal silicon wafers " Thin SolidFilms, Vol. 517, pp. 1858-1867,2009
15. S-Y. Pao, M-C. Chao et al., "Analysis and experiment of HBARfrequency spectra and applications to characterize the piezoelectric thin filmand to HBAR design", IEEE Int. Freq. Contr. Symp. and PDA Exhib., pp.27-35, 2002
16. H. Zhang, S-Y. Zhang et al., "Parameter characterization ofhigh-overtone bulk acoustic resonators by resonant spectrum method",Ultrasonics Vol. 43, pp. 635-642, 2005
17. D. Cornez, S. Lapp et al., "Acoustical parameter characterisation ofAluminium Nitride Thin Film BAW resonator using resonant spectrum method",IEEE Ultrasonics Symposium, pp. 1437-1440, 2007
18. Y. Zhang, Z. Wang et al., "Resonant spectrum method to characterizepiezoelectric thin films in composite resonators", IEEE Trans. Ultras.,Ferro. and Freq. Control, Vol 50, pp. 321-333, 2003
19. S. Wu, Z-X. Lin et al., "Bulk acoustic wave analysis of crystallineplane oriented ZnO films", Journal of Applied Physics, Vol. 102, 084908,2007
20. Y. Zhang, Z. Wang et al., "Direct characterization of ZnO films incomposite resonators by the resonance spectrum method", IEEE UltrasonicsSymposium, pp. 991-994, 1999
21. R. Triboulet and J. Perrière, "Epitaxial growth of ZnOfilms", Prog. Cryst. Growth and Charac. of Mat., Vol. 47, pp. 65-138, 2003
22. L. Garcia-Gancedo, J. Pedros et al., "Zinc oxide thin filmsreactively sputtered at high rates for application in FBARbased gravimetricbiosensors", Proceedings of the 2nd Int. Conf on Nanoman., in press, 2010
23. K. J. Coakley, J. D. Splett et al., "Estimation of Q factors andresonant frequencies", IEEE Trans. Micro. Theo. & Tech., Vol. 51, pp.862-868, 2003