Novel sputtering technology for grain-size control

IEEE Transactions on Magnetics

Volumn 40, Issue 4 II, 2004, Pages 2443-2445

  Vopsaroiu, Marian ^a   Thwaites, M J ^b   Rand, S ^b   Grundy, P J ^c   O'Grady, K ^a  

^a UNIVERSITY OF YORK   (United Kingdom)

^b Plasma Quest Limited   (United Kingdom)

^c UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

Cr thin films; Grain size control; Novel plasma sputtering

Indexed keywords

CHROMIUM; FERROMAGNETIC MATERIALS; GRAIN SIZE AND SHAPE; MAGNETIC RECORDING; MAGNETRON SPUTTERING; PLASMA APPLICATIONS; SIGNAL THEORY; VOLTAGE CONTROL;

CR THIN FILMS; GRAIN-SIZED CONTROL; NOVEL PLASMA SPUTTERING;

MAGNETIC THIN FILMS;

EID: 4444224965     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2004.828971     Document Type: Article

References (7)

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