Deposition and characterization of sputtered ZnO films

Superlattices and Microstructures

Volumn 42, Issue 1-6, 2007, Pages 89-93

  Dang, W L ^a   Fu, Y Q ^a   Luo, J K ^a   Flewitt, A J ^a   Milne, W I ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

RF magnetron sputtering; Zinc oxide

Indexed keywords

ARGON; DEPOSITION; MAGNETRON SPUTTERING; OPTIMIZATION; OXYGEN; THERMAL EFFECTS; ZINC OXIDE;

DEPOSITION PARAMETERS; GAS RATIOS; RADIO FREQUENCY MAGNETRON SPUTTERING;

THIN FILMS;

EID: 34548510153     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2007.04.081     Document Type: Article

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