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Thin Solid Films

Volumn 520, Issue 1, 2011, Pages 280-286

Structural properties of RF-magnetron sputtered Cu2O thin films

(6) Azanza Ricardo, C L a D'Incau, M a Leoni, M a Malerba, C a,b Mittiga, A b Scardi, P a

a UNIVERSITY OF TRENTO (Italy)

b ENEA C R CASACCIA (Italy)

Author keywords

Cuprite; Residual stress; RF magnetron sputtering; Thin films

Indexed keywords

CU2O FILMS; CUPRITE; CUPROUS OXIDE; DEPOSITION PARAMETERS; DEPOSITION TEMPERATURES; OXIDE SUBSTRATES; PREFERRED ORIENTATIONS; REACTIVE GAS; RF-MAGNETRON SPUTTERING; SINGLE LAYER; SODA LIME GLASS SUBSTRATE;

DEPOSITION; MAGNETRON SPUTTERING; MICROSTRUCTURE; RESIDUAL STRESSES; STRUCTURAL PROPERTIES; SUBSTRATES; THIN FILMS; TUNGSTEN; VAPOR DEPOSITION; X RAY DIFFRACTION; ZINC OXIDE;

OXIDE FILMS;

EID: 80054024059 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.07.066 Document Type: Article

Times cited : (25)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.