Electrodeposited copper oxide films: Effect of bath pH on grain orientation and orientation-dependent interfacial behavior

Thin Solid Films

Volumn 515, Issue 5, 2007, Pages 3090-3095

  Wang, L C ^a   de Tacconi, N R ^a   Chenthamarakshan, C R ^a   Rajeshwar, K ^a   Tao, M ^b  

^a UNIVERSITY OF TEXAS AT ARLINGTON   (United States)

^b University of Texas at Arlington   (United States)

Author keywords

Cathodic electrodeposition; Flat band potential; Grain orientation

Indexed keywords

CRYSTAL ORIENTATION; ELECTRODEPOSITION; GRAIN BOUNDARIES; INTERFACES (MATERIALS); PH EFFECTS; X RAY DIFFRACTION;

CATHODIC ELECTRODEPOSITION; FLAT BAND POTENTIAL; GRAIN ORIENTATION;

THIN FILMS;

EID: 33845926091     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.08.041     Document Type: Article

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