메뉴 건너뛰기




Volumn 65-66, Issue 1, 2011, Pages 33-37

Junctionless Nanowire Transistor (JNT): Properties and design guidelines

Author keywords

Fin FET; MOSFET; Multigate FET; Nanowire transistor

Indexed keywords

ACCUMULATION MODES; BULK CONDUCTION; BULK SILICON; CONDUCTION MECHANISM; CURRENT DRIVES; DESIGN GUIDELINES; DOPING CONCENTRATION; ELECTRICAL CHARACTERISTIC; FIN FET; FULLY DEPLETED; GATE CAPACITANCE; GATE ELECTRODES; HEAVILY DOPED; INTRINSIC DEVICE; MOSFET; MULTIGATE FET; NANOWIRE TRANSISTOR; NANOWIRE TRANSISTORS; PHYSICAL PARAMETERS; SILICON CHANNEL; SURFACE CHANNEL; VARIABLE RESISTORS;

EID: 80054023209     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2011.06.004     Document Type: Conference Paper
Times cited : (390)

References (15)
  • 2
    • 33947678825 scopus 로고    scopus 로고
    • Device design guidelines for nano-scale MuGFETs
    • DOI 10.1016/j.sse.2006.11.013, PII S0038110106003947
    • Chi-Woo Lee, Se-Re-Na Yun, Chong-Gun Yu, Jong-Tae Park, and J.P. Colinge Device design guidelines for nano-scale MuGFETs Solid State Electron 51 3 2007 505 510 (Pubitemid 46497252)
    • (2007) Solid-State Electronics , vol.51 , Issue.3 , pp. 505-510
    • Lee, C.-W.1    Yun, S.-R.-N.2    Yu, C.-G.3    Park, J.-T.4    Colinge, J.-P.5
  • 8
    • 80054047034 scopus 로고    scopus 로고
    • http://www.comsol.com/
  • 10
    • 0242332710 scopus 로고    scopus 로고
    • Sensitivity of double-gate and FinFET devices to process variations
    • S. Xiong, and J. Bokor Sensitivity of double-gate and FinFET devices to process variations IEEE Trans Electron Devices 50 11 2003 2255 2261
    • (2003) IEEE Trans Electron Devices , vol.50 , Issue.11 , pp. 2255-2261
    • Xiong, S.1    Bokor, J.2
  • 11
    • 56049124554 scopus 로고    scopus 로고
    • Sensitivity of trigate MOSFETs to random dopant induced threshold voltage fluctuations
    • R. Yan, D. Lynch, T. Cayron, D. Lederer, A. Afzalian, and Chi-Woo Lee Sensitivity of trigate MOSFETs to random dopant induced threshold voltage fluctuations Solid-State Electron 52 12 2008 1872 1876
    • (2008) Solid-State Electron , vol.52 , Issue.12 , pp. 1872-1876
    • Yan, R.1    Lynch, D.2    Cayron, T.3    Lederer, D.4    Afzalian, A.5    Lee, C.-W.6
  • 12
    • 34547921216 scopus 로고    scopus 로고
    • Random dopant fluctuation in limited-width FinFET technologies
    • DOI 10.1109/TED.2007.901154
    • Meng-Hsueh Chiang, Jeng-Nan Lin, Keunwoo Kim, and Ching-Te Chuang Random dopant fluctuation in limited-width FinFET technologies IEEE Trans Electron Devices 54 8 2007 2055 2060 (Pubitemid 47249839)
    • (2007) IEEE Transactions on Electron Devices , vol.54 , Issue.8 , pp. 2055-2060
    • Chiang, M.-H.1    Lin, J.-N.2    Kim, K.3    Chuang, C.-T.4
  • 13
    • 77949928186 scopus 로고    scopus 로고
    • Tri-gate bulk MOSFET design for improved robustness to random dopant fluctuations
    • Changhwan Shin, Carlson A, Xin Sun, Kanghoon Jeon, Tsu-Jae King Liu. Tri-gate bulk MOSFET design for improved robustness to random dopant fluctuations. In: Silicon Nanoelectronics Workshop; 2008. p. 1-2
    • (2008) Silicon Nanoelectronics Workshop , pp. 1-2
    • Shin, C.1    Carlson, A.2    Sun, X.3    Jeon, K.4    King Liu, T.5
  • 14
    • 80054023108 scopus 로고    scopus 로고
    • http://www.silvaco.com/products/device-simulation/atlas.html
  • 15
    • 36849092375 scopus 로고    scopus 로고
    • Design and optimization of FinFETs for ultra-low-voltage analog applications
    • DOI 10.1109/TED.2007.908596
    • A. Kranti, and G.A. Armstrong Design and optimization of FinFETs for ultra-low-voltage analog applications IEEE Trans Electron Device 54 2007 3308 3316 (Pubitemid 350225938)
    • (2007) IEEE Transactions on Electron Devices , vol.54 , Issue.12 , pp. 3308-3316
    • Kranti, A.1    Armstrong, G.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.