Fabrication of discrete gallium nanoislands on the surface of a Si(001) substrate using a focused ion beam

Nanotechnology

Volumn 22, Issue 42, 2011, Pages

  Wang, Hao ^a   Gray, Jennifer L ^a  

^a University of Pittsburgh   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE SIZE; CHEMICAL ETCH; FLUENCES; ION DOSE; NANO-ISLANDS; NANO-SCALE SURFACES; NUCLEATION SITES; QUANTUM DOT STRUCTURE; SI (001) SUBSTRATE; SPECIFIC SITES; SURFACE TEMPLATES;

FOCUSED ION BEAMS; IONS; SILICON; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

GALLIUM ALLOYS;

EID: 80053264052     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/42/425602     Document Type: Article

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