Novel method for site-controlled surface nanodot fabrication by ion beam synthesis

Nano Letters

Volumn 5, Issue 4, 2005, Pages 771-776

  Buckmaster, Ryan ^a   Hanada, Takashi ^a   Kawazoe, Yoshiyuki ^a   Cho, Meoung Whan ^a,b   Yao, Takafumi ^a,b   Urushihara, Nobuaki ^c   Yamamoto, Akira ^c  

^a TOHOKU UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c ULVAC PHI Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; GALLIUM; GROWTH (MATERIALS); ION BEAMS; ION IMPLANTATION; MORPHOLOGY; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SILICA; ULTRAHIGH VACUUM;

ION BEAM SYNTHESIS; NANODOTS; NANOWIRE GROWTH; VACUUM ANNEALING;

NANOTECHNOLOGY;

EID: 18144384237     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl048044j     Document Type: Article

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