Preparation and characterization of sol-gel derived (Li,Ta,Sb) modified (K,Na)NbO3 lead-free ferroelectric thin films

Materials Chemistry and Physics

Volumn 130, Issue 1-2, 2011, Pages 165-169

  Wang, Li ^a   Zuo, Ruzhong ^a   Liu, Longdong ^a   Su, Hailin ^a   Shi, Min ^a   Chu, Xiangcheng ^b   Wang, Xiaohui ^b   Li, Longtu ^b  

^a HEFEI UNIVERSITY OF TECHNOLOGY   (China)

^b TSINGHUA UNIVERSITY   (China)

Author keywords

Ferroelectricity; Microstructure; Sol gel growth; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPES; BULK CERAMICS; COERCIVE FIELD; CROSS SECTION; DIELECTRIC PERMITTIVITIES; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; LEAD-FREE FERROELECTRICS; LOSS TANGENT; POLYCRYSTALLINE PEROVSKITE; RAMAN SPECTRUM; SOL-GEL GROWTH; SPIN-COATING METHOD; TOP SURFACE;

ANTIMONY; ATOMIC FORCE MICROSCOPY; CALCINATION; COERCIVE FORCE; FERROELECTRIC FILMS; FERROELECTRIC THIN FILMS; FERROELECTRICITY; GELS; NIOBIUM; NIOBIUM OXIDE; PEROVSKITE; POLARIZATION; PYROLYSIS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SODIUM; SOL-GEL PROCESS; SOL-GELS; SOLS; TANTALUM; THERMOANALYSIS; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

FILM PREPARATION;

EID: 80052586756     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2011.06.022     Document Type: Article

References (32)

1. A. Suárez-Gómez, J.M. Saniger-Blesa, and F. Calderón-Piñar Mater. Chem. Phys. 123 2010 304
2. C.Q. Liu, W.L. Li, W.D. Fei, S.Q. Zhang, and J.N. Wang J. Alloys Compd. 493 2010 499
3. J.H. Park, J.S. Bae, H.J. Park, Y.S. Kim, B.E. Jun, B.C. Choi, and J.H. Jeong Thin Solid Films 516 2008 5304
4. J. Du, and K.L. Choy Mater. Sci. Eng. C 26 2006 1117
5. Y.P. Guo, D. Akai, K. Sawada, and M. Ishida Solid State Sci. 10 2008 928
6. J.G. Wu, and J. Wang J. Appl. Phys. 106 2009 066101
7. C.R. Cho, and A. Grishin Appl. Phys. Lett. 75 1999 268
8. F.P. Lai, and J.F. Li J. Sol-Gel Sci. Technol. 42 2007 287
9. C.W. Ahn, S.Y. Lee, H.J. Lee, A. Ullah, J.S. Bae, E.D. Jeong, J.S. Choi, B.H. Park, and I.W. Kim J. Phys. D: Appl. Phys. 42 2009 215304
10. K. Tanaka, H. Hayashi, K. Kakimoto, H. Ohsato, and T. Iijima Jpn. J. Appl. Phys. 46 2007 6964
11. Y. Nakashima, W. Sakamoto, H. Maiwa, T. Shimura, and T. Yogo Jpn. J. Appl. Phys. 46 2007 L311
12. C.W. Ahn, E.D. Jeong, S.Y. Lee, H.J. Lee, S.H. Kang, and I.W. Kim Appl. Phys. Lett. 93 2008 212905
13. F.P. Lai, J.F. Li, Z.X. Zhu, and Y. Xu J. Appl. Phys. 106 2009 064101
14. N.T. Chua, L. You, J. Ma, and J.L. Wang Thin Solid Films 518 2010 6777
15. K. Tanaka, K.I. Kakimoto, H. Ohsato, and T. Iijima Ferroelectrics 358 2007 175
16. R.Z. Zuo, J. Fu, and D.Y. Lv J. Am. Ceram. Soc. 92 2009 283
17. Y. Saito, H. Takao, T. Tani, T. Nonoyama, K. Takatori, T. Homma, T. Nagaya, and M. Nakamura Nature 432 2004 84
18. M. Abazari, and A. Safari J. Appl. Phys. 105 2009 094101
19. M. Abazari, T. Choi, S.W. Cheong, and A. Safari J. Phys. D: Appl. Phys. 43 2010 025405
20. M. Blomqvist, S. Khartsev, and A. Grishin Integr. Ferroelectr. 80 2006 97
21. S. Khartsev, A. Grishin, J. Andrasson, J.H. Koh, and J.S. Song Integr. Ferroelectr. 55 2003 769
22. E. Cao, J.F. Hu, H.W. Qin, F. Ji, M.L. Zhao, and M.H. Jiang J. Alloys Compd. 509 2011 2914
23. X. Yan, W. Ren, X.Q. Wu, P. Shi, and X. Yao J. Alloys Compd. 508 2010 129
24. F. Söderlind, P.O. Käll, and U. Helmersson J. Cryst. Growth 281 2005 468
25. H.Q. Wang, R.Z. Zuo, J. Fu, and Y. Liu J. Alloys Compd. 509 2011 936
26. S.N. Song, J.W. Zhai, and X. Yao Mater. Sci. Eng. B 145 2007 28
27. Y.Q. Huang, M.D. Liu, Z. Li, Y.K. Zeng, and S.B. Liu Mater. Sci. Eng. B 97 2003 111
28. J. Mendiola, M.L. Calzada, P. Ramos, M.J. Martin, and F. Agulló-Rueda Thin Solid Films 315 1998 195
29. K. Tanaka, K.I. Kakimoto, and H. Ohsato J. Cryst. Growth 294 2006 209
30. P.C. Goh, and K. Yao J. Am. Ceram. Soc. 92 2009 1322
31. J. Suchanicz Mater. Sci. Eng. B 55 1998 114
32. N.L. Amsei Júnior, A.Z. Simões, L.S. Cavalcante, F. Moura, E. Longo, and J.A. Varela J. Alloys Compd. 461 2008 326