Photocatalytic activity and hydroxyl radical formation of carbon-doped TiO2 nanocrystalline: Effect of calcination temperature

Chemical Engineering Journal

Volumn 148, Issue 2-3, 2009, Pages 248-253

  Xiao, Qi ^a   Ouyang, Linli ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

Carbon doped TiO2 nanocrystalline; Hydroxyl radical; Photocatalytic activity

Indexed keywords

ABSORPTION; ACIDS; CALCINATION; FLUORESCENCE; FREE RADICALS; GELATION; LIGHT; LIGHT ABSORPTION; NANOCRYSTALLINE MATERIALS; PHOTOELECTRON SPECTROSCOPY; RECONNAISSANCE AIRCRAFT; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

AUTO-COMBUSTION METHODS; BRUNAUER-EMMETT-TELLER METHODS; CALCINATION TEMPERATURES; FLUORESCENCE TECHNIQUES; FLUORESCENT PRODUCTS; FORMATION RATES; HYDROXYL RADICAL; HYDROXYL RADICAL FORMATIONS; OH RADICALS; PER UNITS; PHOTOCATALYTIC ACTIVITY; POSITIVE CORRELATIONS; SAMPLE SURFACES; SOL - GELS; SURFACE AREAS; TEREPHTHALIC ACIDS; UV-VIS DIFFUSE REFLECTANCE SPECTROSCOPIES; VISIBLE LIGHT ABSORPTIONS; VISIBLE-LIGHT IRRADIATIONS; X- RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTRUM;

PHOTOCATALYSIS;

EID: 61649098613     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2008.08.024     Document Type: Article

References (30)

1. Neppolian B., Choi H.C., Sakthivel S., Arabindoo B., and Murugesan V. Chemosphere 46 (2002) 1173
2. Sakthivel S., Neppolian B., Shankar M.V., Arabindoo B., Palanichamy M., and Murugesan V. Sol. Energy Mater. Sol. Cells 77 (2003) 65
3. Kuo W.S., and Ho P.H. Chemosphere 45 (2001) 77
4. Tang J., Zou Z., and Ye J. Chem. Mater. 16 (2004) 1644
5. Asashi R., Morikawa T., Ohwaki T., Aoki K., and Taga Y. Science 293 (2001) 269
6. Khan S.U.M., Al-shahry M., and Ingler Jr. W.B. Science 297 (2002) 2243
7. Umebayashi T., Yamaki T., Itoh H., and Asai K. Appl. Phys. Lett. 81 (2002) 454
8. Hong X.T., Wang Z.P., Cai W.M., Lu F., Zhang J., Yang Y.Z., Ma N., and Liu Y.J. Chem. Mater. 17 (2005) 1548
9. Irie H., Watanabe Y., and Hashimoto K. Chem. Lett. 32 (2003) 772
10. Sakthivel S., and Kwasch H. Angew. Chem. Int. Ed. 42 (2003) 4908
11. Nagaveni K., Sivalingam G., Hegde M.S., and Madras G. Appl. Catal. B: Environ. 48 (2004) 83
12. Nagaveni K., Hegde M.S., RaVishankar N., Subbanna G.N., and Madras G. Langmuir 20 (2004) 2900
13. Selvan R.K., Augustin C.O., Berchmans L.J., and Saraswathi R. Mater. Res. Bull. 38 (2003) 41
14. Spurr R.A., and Myers H. Anal. Chem. 29 (1957) 760
15. Ishibashi K., Fujishima A., Watanabe T., and Hashimoto K. Electrochem. Commun. 2 (2000) 207
16. Ohno T., Tsubota T., Toyofuku M., and Inaba R. Catal. Lett. 98 (2004) 255
17. Li Y., Hwang D.-S., Lee N.H., and Kim S.-J. Chem. Phys. Lett. 404 (2005) 25
18. Ren W., Ai Z., Jia F., Zhang L., Fan X., and Zou Z. Appl. Catal. B: Environ. 69 (2007) 138
19. Tseng Y.-H., Kuo C.-S., Huang C.-H., Li Y.-Y., Li P.-W., Cheng C.-L., and Wong M.-S. Nanotechnology 17 (2006) 2490
20. Yoshitake M., Thananan A., Aizawaki T., and Yoshihara K. Surf. Interface Anal. 34 (2002) 698
21. Wang Y.L. Surf. Coat. Technol. 150 (2002) 257
22. Carley A.F., Spoto G., Chalker P.R., Riviere J.C., and Roberts M.W. J. Chem. Soc., Faraday Trans. I 83 (1987) 351
23. Pouilleau J., Devilliers D., Groult H., and Marcus P. J. Mater. Sci. 32 (1998) 5645
24. Madhu Kumar P., Badrinarayanan S., and Sastry M. Thin Solid Films 358 (2000) 122
25. Isao N., Nobuaki N., Shuzo K., Tatsuhiko I., Shinichi S., and Koji T. J. Mol. Catal. A: Chem. 161 (2000) 205
26. Khan H.M., Anwar M., and Ahmad G. J. Radioanal. Nucl. Chem. Lett. 200 (1995) 521
27. Mason T.J., Lorimer J.P., Bates D.M., and Zhao Y. Ultrasonics Sonochem. 1 (1994) S91
28. Fang X., Gertraud M., and von Sonntag C. Ultrasonics Sonochem. 3 (1996) 57
29. Barreto J.C., Smith G.S., Strobel N.H.P., McQuillin P.A., and Miller T.A. Life Sci. 56 (1994) L89
30. Ammar H., Hinda L., Mohamed K., Elimame E., Chantal G., and Jean-Marie H. Appl. Catal. B: Environ. 31 (2001) 145