Growth of TiO2 thin film by reactive RF magnetron sputtering using oxygen radical

Journal of Alloys and Compounds

Volumn 449, Issue 1-2, 2008, Pages 375-378

  Ogawa, H ^a   Higuchi, T ^a   Nakamura, A ^a   Tokita, S ^a   Miyazaki, D ^a   Hattori, T ^a   Tsukamoto, T ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Anatase; Oxygen radical radiation; RF magnetron sputtering; Rutile; TiO2 thin film

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLIZATION; DEPOSITION; MAGNETRON SPUTTERING; THIN FILMS; TITANIUM OXIDES;

A-AXIS ORIENTATION; ANATASE STRUCTURE; OXYGEN RADICAL RADIATION; RF MAGNETRON SPUTTERING;

FILM GROWTH;

EID: 36348999778     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2006.02.103     Document Type: Article

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