Application of amorphous carbon based materials as antireflective coatings on crystalline silicon solar cells

Journal of Applied Physics

Volumn 110, Issue 4, 2011, Pages

  Da Silva, D S ^a   Cortes A D S ^a   Oliveira Jr , M H ^a,b   Motta, E F ^a   Viana, G A ^a   Mei, P R ^a   Marques, F C ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION COEFFICIENTS; AMORPHOUS CARBON STRUCTURES; ANTI REFLECTIVE COATINGS; CARBON BASED MATERIALS; CHEMICAL INERTNESS; CRYSTALLINE SILICON SOLAR CELLS; DOUBLE LAYERS; FILTERED CATHODIC VACUUM ARC TECHNIQUES; MAGNESIUM FLUORIDE; P-N JUNCTION; POTENTIAL APPLICATIONS; SINGLE LAYER; TA-C FILM; TETRAHEDRAL AMORPHOUS CARBON (TA-C); TEXTURIZATION;

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; CHEMICAL STABILITY; CHEMICAL VAPOR DEPOSITION; COATINGS; CRYSTALLINE MATERIALS; DIAMOND LIKE CARBON FILMS; MAGNESIUM; MAGNESIUM COMPOUNDS; MECHANICAL STABILITY; NANOSTRUCTURED MATERIALS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMERIC FILMS; REFRACTIVE INDEX; SEMICONDUCTOR JUNCTIONS; SILICON SOLAR CELLS; TIN; TIN DIOXIDE; VACUUM APPLICATIONS; ZINC COATINGS; ZINC SULFIDE;

AMORPHOUS SILICON;

EID: 80052398803     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3622515     Document Type: Article

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