Influence of the process parameters on the properties of hydrogenated amorphous carbon thin films deposited using ECR plasma

Thin Solid Films

Volumn 383, Issue 1-2, 2001, Pages 196-199

  Piazza, F ^a   Arnal, Y ^b   Grambole, D ^c   Herrmann, F ^c   Kildemo, M ^d   Lacoste, A ^b   Relihan, G ^d   Golanski, A ^a  

^a Lab Phys Applic S   (France)

^b LABORATOIRE D ELECTROTECHNIQUE DE GRENOBLE   (France)

^c INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^d UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; DEPOSITION; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; HYDROGENATION; OPTICAL PROPERTIES; PLASMA APPLICATIONS; SINGLE CRYSTALS; THIN FILMS;

HARD COATINGS;

AMORPHOUS FILMS;

EID: 0035247903     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01580-7     Document Type: Article

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