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Volumn 519, Issue 22, 2011, Pages 7650-7658

Multi-scale modelling of silicon nanocrystal synthesis by Low Pressure Chemical Vapor Deposition

Author keywords

Chemical vapour deposition; Density Functional Theory; Modelling; Multi scale approach; Nanocrystals; Silicon

Indexed keywords

AB INITIO MODELLING; AB INITIO STUDY; AREA DENSITY; AUTOCATALYTIC; CHEMICAL VAPOUR DEPOSITION; DENSITY FUNCTIONALS; DEPOSITION MECHANISM; DESORPTION KINETICS; EXPERIMENTAL DATA; FLUENT CODE; HYDROGEN DESORPTION; INDUSTRIAL REACTORS; KINETIC DATA; LIMITING STEP; MODELLING; MULTI-SCALE APPROACHES; MULTI-SCALE MODELLING; MULTISCALE MODELS; NUCLEATION AND GROWTH; O-H BOND; SILANOLS; SILICON NANOCRYSTALS; SILYLENES; STICKING COEFFICIENTS; SURFACE SITES; THREE STAGES; TRANSIENT CONDITIONS;

EID: 80052130565     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.05.016     Document Type: Article
Times cited : (10)

References (33)
  • 20
    • 80052131716 scopus 로고    scopus 로고
    • Ph.D thesis INSA, Lyon, France
    • F. Mazen, Ph.D thesis INSA, Lyon, France, 2003.
    • (2003)
    • Mazen, F.1
  • 25
    • 80052132246 scopus 로고    scopus 로고
    • PhD thesis, INP Toulouse, France
    • I. Zahi, PhD thesis, INP Toulouse, France (2009).
    • (2009)
    • Zahi, I.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.