Semi-insulating properties control by CVD process modelling

Materials Science and Engineering B

Volumn 37, Issue 1-3, 1996, Pages 30-34

  Cordier, C ^a   Dehan, E ^b   Scheid, E ^b   Duverneuil, P ^a  

^a LABORATOIRE DE GÉNIE CHIMIQUE   (France)

^b LAAS CNRS   (France)

Author keywords

Deposition; Modelisation; Silicon; Silicon oxide

Indexed keywords

EID: 0013114311     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-5107(95)01453-5     Document Type: Article

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