Numerical and experimental study of polysilicon deposition on silicon tubes

Journal of Crystal Growth

Volumn 250, Issue 1-2, 2003, Pages 41-49

  Cai, D ^a   Zheng, L L ^a   Wan, Y ^b   Hariharan, A V ^b   Chandra, M ^b  

^a Stony Brook University   (United States)

^b GT Solar Incorporated   (United States)

Author keywords

A1. Computer simulation; A1. Mass transfer; A1. Tubular CVD reactor; A3. Chemical vapor deposition process; B2. Semiconducting silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; COOLING; MASS TRANSFER; SEMICONDUCTING SILICON; TUBES (COMPONENTS);

COOLING GAS;

POLYSILICON;

EID: 0037370215     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(02)02212-1     Document Type: Conference Paper

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