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Volumn 50, Issue 8 PART 3, 2011, Pages
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Preparation of SiO2 passivation thin film for improved the organic light-emitting device life time
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Author keywords
[No Author keywords available]
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Indexed keywords
FACING TARGET SPUTTERING;
FIELD EMISSION SCANNING ELECTRON MICROSCOPY;
FOURIER TRANSFORM INFRARED;
LIFE-TIMES;
MINIMUM DAMAGE;
OPTIMUM CONDITIONS;
ORGANIC LAYERS;
ORGANIC LIGHT-EMITTING DEVICES;
OXYGEN GAS FLOW;
PHOTOLUMINESCENCE INTENSITIES;
WATER VAPOR TRANSMISSION RATE;
WORKING PRESSURES;
FIELD EMISSION MICROSCOPES;
FLOW OF GASES;
FLOW RATE;
FOURIER TRANSFORMS;
LIGHT EMISSION;
ORGANIC LIGHT EMITTING DIODES (OLED);
OXYGEN;
PASSIVATION;
SCANNING ELECTRON MICROSCOPY;
SILICON COMPOUNDS;
SPACECRAFT INSTRUMENTS;
THIN FILMS;
WATER VAPOR;
FILM PREPARATION;
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EID: 80051964002
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.50.08KE02 Document Type: Conference Paper |
Times cited : (16)
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References (15)
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