The preparation of indium tin oxide films as a function of oxygen gas flow rate by a facing target sputtering system

Journal of Ceramic Processing Research

Volumn 8, Issue 1, 2007, Pages 19-21

  Kim, Kyung Hwan ^a  

^a Gachon University   (South Korea)

Author keywords

Facing target sputtering; ITO; TCO; TOLED

Indexed keywords

EID: 33947589220     PISSN: 12299162     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

1. C.G. Granqvist, Appl. Phys. A52 (1991) 83-93.
2. S. Major, A. Banerjee, and K.L. Chopra, Thin Solid Films 108 (1983) 333-340.
3. R.H. Freied, R.W. Gymer, A.B. Holmesm J.H. Burroughnes, R.N. Mark, C. Taliani, D.D.C. M. Logdlund, and R.W. Salaneck, Nature 397 (1999) 121-128.
4. C.C. Wu, C.I. Wu, J.C. Sturn, and A. Kahn, Appl. Phys. Lett. 70 (1997) 1384-1386.
5. F. Niino, H. Hirasawa, and K. Kondo, Thin Solid Films 411 (2002) 28-31.
6. F.O. Adurodija, H. Izumi, T. Ishihara, H. Yoshioka, M. Motoyama, and K. Murai, Jap. J. Appl. Phys. 39 (2000) L377-L379.
7. S. Ishibashi, Y. Higuchi, Y. Ota, and K. Nakamura, J. Vac. Sci. Technol. A 8[3] (1990) 1403-1406.
8. Y. Hoshi, H. Omi, and K. Funatsu, Thin Solid Films 445 (2003) 245-250.
9. J.S. Yang, M.J. Keum, and K.H. Kim, Surface and Coating Technology 169-170 (2003) 575-578.
10. J.O. Park, J.H. Lee, J.J. Kim, S.H. Cho, and Y.K. Cho, Thin Solid Films 474 (2005) 127-132.